Fluorine segregation and incorporation during solid-phase epitaxy of Si

Applied Physics Letters

Volumn 86, Issue 12, 2005, Pages 1-3

  Mirabella, S ^a   Impellizzeri, G ^a   Bruno, E ^a   Romano, L ^a   Grimaldi, M G ^a   Priolo, F ^a   Napolitani, E ^b   Carnera, A ^b  

^a UNIVERSITY OF CATANIA   (Italy)

^b UNIVERSITY OF PADOVA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHIZATION; DIFFUSION; EPITAXIAL GROWTH; FLUORINE; MOS DEVICES; RAPID THERMAL ANNEALING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEGREGATION (METALLOGRAPHY); SEMICONDUCTOR JUNCTIONS;

CRYSTALLINE QUALITY; END-OF-RANGE (EOR) DEFECTS; SOLID-PHASE EPITAXY (SPE); TRANSIENT ENHANCED DIFFUSION (TED);

SILICON;

EID: 17944381348     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1886907     Document Type: Article

References (15)

1. The International Technology Roadmap for Semiconductors, 2003.
2. R. G. Wilson, J. Appl. Phys. 54, 6879 (1983).
3. D. F. Downey, J. W. Chow, E. Ishida, and K. S. Jones, Appl. Phys. Lett. 73, 1263 (1998).
4. A. Mokhberi, R. Kasnavi, P. B. Griffin, and J. D. Plummer, Appl. Phys. Lett. 80, 3530 (2002).
5. J. M. Jacques, L. S. Robertson, K. S. Jones, M. E. Law, M. Rendon, and J. Bennett, Appl. Phys. Lett. 82, 3469 (2003).
6. G. Impellizzeri, J. H. R. dos Santos, S. Mirabella, F. Priolo, E. Napolitani, and A. Carnera, Appl. Phys. Lett. 84, 1862 (2004).
7. R. Duffy, V. C. Venezia, A. Heringa, B. J. Pawlak, M. J. P. Hopstaken, G. C. J. Maas, Y. Tamminga, T. Dao, F. Roozeboom, and L. Pelaz, Appl. Phys. Lett. 84, 4283 (2004).
8. B. J. Pawlak, R. Surdeanu, B. Colombeau, A. J. Smith, N. E. B. Cowern, R. Lindsay, W. Vandervost, B. Brijs, O. Richard, and F. Cristiano, Appl. Phys. Lett. 84, 2055 (2004).
9. A. Claverie, B. Colombeau, B. de Mauduit, C. Bonafos, X. Hebras, G. Ben Assayag, and F. Cristiano, Appl. Phys. A: Mater. Sci. Process. 76, 1025 (2003).
10. P. A. Stolk, J. H.-J. Gossmann, D. J. Eaglesham, D. C. Jacobson, C. S. Rafferty, G. H. Gilmer, M. Jaraìz, J. M. Poate, H. S. Luftman, and T. E. Haynes, J. Appl. Phys. 81, 6031 (1997).
11. M. Y. Tsai, D. S. Day, B. G. Streetman, P. Williams, and C. A. Evans, Jr., J. Appl. Phys. 50, 188 (1979).
12. I. Suni, U. Shreter, M-A. Nicolet, and J. E. Baker, J. Appl. Phys. 56, 273 (1984).
13. G. L. Olson and J. A. Roth, Mater. Sci. Rep. 3, 1 (1988).
14. W. G. Pfann, Zone Melting (Wiley, New York, 1958).
15. G. R. Nash, J. F. W. Schiz, C. D. Marsh, P. Ashburn, and G. R. Booker, Appl. Phys. Lett. 75, 3671 (1999).