Transient enhanced diffusion of B mediated by self-interstitials in preamorphized Ge

Applied Physics Letters

Volumn 96, Issue 20, 2010, Pages

  Napolitani, E ^a   Bisognin, G ^a   Bruno, E ^b   Mastromatteo, M ^a   Scapellato, G G ^b   Boninelli, S ^b   De Salvador, D ^a   Mirabella, S ^b   Spinella, C ^c   Carnera, A ^a   Priolo, F ^b  

^a UNIVERSITY OF PADOVA   (Italy)

^b UNIVERSITY OF CATANIA   (Italy)

^c CNR   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING TEMPERATURES; B DIFFUSION; END-OF-RANGE DAMAGES; EPITAXIALLY GROWN; IMPURITY DIFFUSION; INTERSTITIAL IMPLANTATION; INTERSTITIALS; TRANSIENT ENHANCED DIFFUSION;

BORON; BORON COMPOUNDS; DELTA FUNCTIONS; DIFFUSION IN SOLIDS; DISSOLUTION; ENHANCED RECOVERY; WEAR RESISTANCE;

GERMANIUM;

EID: 77952968784     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3429084     Document Type: Article

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