Role of fluorine in suppressing boron transient enhanced diffusion in preamorphized Si

Applied Physics Letters

Volumn 84, Issue 11, 2004, Pages 1862-1864

  Impellizzeri, G ^a   Dos Santos, J H R ^a,c   Mirabella, S ^a   Priolo, F ^a   Napolitani, E ^b   Camera, A ^b  

^a UNIVERSITY OF CATANIA   (Italy)

^b UNIVERSITY OF PADOVA   (Italy)

^c FEDERAL UNIVERSITY OF RIO GRANDE DO SUL   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

BONDING; BORON; CRYSTALS; DEPOSITION; DIFFUSION; HEAT TREATMENT; MOLECULAR BEAM EPITAXY; RAPID THERMAL ANNEALING; REDUCTION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SECONDARY ION MASS SPECTROMETRY; SILICON;

END-OF-RANGE (EOR); SOLID PHASE EPITAXY (SPE);

FLUORINE;

EID: 1842738137     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1675935     Document Type: Article

References (15)

1. The International Technology Roadmap for Semiconductors, 2001.
2. J. F. Ziegler, J. P. Biersack, and U. Littmark, The Stopping and Range of Ions in Solids, Stopping and Ranges of Ions in Matter, vol. 1 (Pergamon, New York, 1984).
3. S. C. Jain, W. Schoenmaker, R. Lindsay, P. A. Stolk, S. Decoutere, M. Willander, and H. E. Maes, J. Appl. Phys. 91, 8919 (2002), and references therein.
4. D. J. Eaglesham, P. A. Stolk, H. J. Gossmann, and J. M. Poate, Appl. Phys. Lett. 65, 2305 (1994).
5. N. E. Cowern, G. Mannino, P. A. Stolk, F. Roozeboom, H. G. A. Huizing, J. G. M. van Berkum, F. Cristiano, A. Claverie, and M. Jaraìz, Phys. Rev. Lett. 82, 4460 (1999).
6. T. P. Ma, J. Vac. Sci. Technol. A 10, 705 (1992).
7. J. D. Williams and P. Ashburn, J. Appl. Phys. 72, 3169 (1992).
8. R. G. Wilson, J. Appl. Phys. 54, 6879 (1983).
9. D. F. Downey, J. W. Chow, E. Ishida, and K. S. Jones, Appl. Phys. Lett. 73, 1263 (1998).
10. Y.-J. Park and J.-J. Kim, J. Appl. Phys. 85, 803 (1999).
11. A. Mokhberi, R. Kasnavi, P. B. Griffin, and J. D. Plummer, Appl. Phys. Lett. 80, 3530 (2002).
12. S. Mirabella, A. Coati, D. De Salvador, E. Napolitani, A. Mattoni, G. Bisognin, M. Berti, A. Camera, A. V. Drigo, S. Scalese, S. Pulvirenti, A. Terrasi, and F. Priolo, Phys. Rev. B 65, 045209 (2002).
13. G. L. Olson and J. A. Roth, Mater. Sci. Rep. 3, l (1988).
14. L. S. Robertson, M. E. Law, K. S. Jones, L. M. Rubin, J. Jackson, P. Chi, and D. S. Simons, Appl. Phys. Lett. 75, 3844 (1999).
15. P. M. Fahey, P. B. Griffin, and J. D. Plummer, Rev. Mod. Phys. 61, 289 (1989).