Growth and characterization of yttrium oxide films by reactive magnetron sputtering

Thin Solid Films

Volumn 519, Issue 15, 2011, Pages 4894-4898

  Zhu, Jiaqi ^a   Zhu, Yuankun ^a   Shen, Weixia ^a   Wang, Yongjie ^a   Han, Jiecai ^a   Tian, Gui ^a   Lei, Pei ^a   Dai, Bing ^a  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

Author keywords

Composition; Magnetron sputtering; Micro structure; Yttrium oxide

Indexed keywords

COMPOSITION; CUBIC PHASE; DEPOSITION PARAMETERS; DIFFERENT SUBSTRATES; FILM DEPOSITION; HIGH TEMPERATURE; LOW TEMPERATURES; OPTICAL APPLICATIONS; OXYGEN PARTIAL PRESSURE; OXYGEN PRESSURE; POLYCRYSTALLINE; PREFERRED GROWTH; REACTIVE MAGNETRON SPUTTERING; SI SUBSTRATES; SUBSTRATE TEMPERATURE;

CERAMIC MATERIALS; FILM GROWTH; MAGNETRON SPUTTERING; MECHANICAL PROPERTIES; OXYGEN; OXYGEN VACANCIES; PHOTOELECTRON SPECTROSCOPY; RAMAN SPECTROSCOPY; SILICON; SUBSTRATES; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; YTTRIUM; YTTRIUM ALLOYS; YTTRIUM OXIDE;

OXIDE FILMS;

EID: 79957652899     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.01.049     Document Type: Conference Paper

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