Atomic layer deposition of y 2O 3 thin films from yttrium tris(N,N′-diisopropylacetamidinate) and water

Chemistry of Materials

Volumn 17, Issue 19, 2005, Pages 4808-4814

  De Rouffignac, Philippe ^a   Park, Jin Seong ^a   Gordon, Roy G ^a  

^a HARVARD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AIR-EXPOSED FILMS; ATOMIC LAYER DEPOSITION (ALD); NANOSCALE DEVICES; VOLATILE;

CRYSTAL STRUCTURE; DEPOSITION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; THERMODYNAMIC STABILITY; WATER; X RAY PHOTOELECTRON SPECTROSCOPY; YTTRIUM COMPOUNDS;

THIN FILMS;

EID: 25844467841     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm050624+     Document Type: Article

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