EUV underlayer materials for 22nm HP and beyond

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7972, Issue , 2011, Pages

  Yao, Huirong ^a   Bogusz, Zachary ^a   Shan, Jianhui ^a   Cho, Joonyeon ^a   Mullen, Salem ^a   Lin, Guanyang ^a   Neisser, Mark ^a  

^a AZ Electronic Materials USA Corp   (United States)

Author keywords

22 nm HP; Absorption; EUV; LWR; Resolution; Sensitivity; Underlayer

Indexed keywords

22 NM HP; EUV; LWR; RESOLUTION; SENSITIVITY; UNDERLAYERS;

ABSORPTION; ELECTRON BEAM LITHOGRAPHY; MANUFACTURE; ROUGHNESS MEASUREMENT; SEMICONDUCTOR DEVICE MANUFACTURE;

MATERIALS;

EID: 79955920615     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.881639     Document Type: Conference Paper

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