Benchmarking commercial EUVL resists at SEMATECH

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6921, Issue , 2008, Pages

  Ma, Andy ^a   Park, Joo On ^a   Dean, Kim ^a   Wurm, Stefan ^a   Naulleau, Patrick ^b  

^a SEMATECH   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

Extreme ultraviolet; Lithography; LWR; Photoresist; Sensitivity

Indexed keywords

DEPTH OF FOCUS; EUV RESISTS; EXPOSURE LATITUDE; EXTREME ULTRAVIOLET; LAWRENCE BERKELEY NATIONAL LABORATORY; LINEWIDTH ROUGHNESS; LWR; MICRO-EXPOSURE TOOL; NEXT GENERATION LITHOGRAPHY; POWER REQUIREMENT; PROCESS WINDOW; SEMATECH; SENSITIVITY;

BENCHMARKING; DEGASSING; EXTREME ULTRAVIOLET LITHOGRAPHY; LIGHT SENSITIVE MATERIALS; PHOTORESISTS; PHOTOSENSITIVITY; ROUGHNESS MEASUREMENT;

LITHOGRAPHY;

EID: 79959332235     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.775037     Document Type: Conference Paper

References (6)

1. A. Brunton, et al., "High-resolution EUV imaging tools for resist exposure and aerial image monitoring, " Proc. SPIE 5751, 78-89 (2005). (Pubitemid 41275376)
2. P. Naulleau, et al., "Status of EUV micro-exposure capabilities at the ALS using the 0.3-NA MET optic, " Proc. SPIE 5374, 881-891 (2004).
3. J. Taylor, D. Sweeney, R. Hudyma, L. Hale, T. Decker, G. Kubiak, W. Sweatt, N. Wester, "EUV Microexposure Tool (MET) for near-term development using a high NA projection system, " 2nd International EUVL Workshop October 19-20, 2000, proceedings available from SEMATECH, Austin, TX.
4. R. Hudyma, J. Taylor, D. Sweeney, L. Hale, W. Sweatt, N. Wester, "E-D characteristics and aberration sensitivity of the Microexposure Tool (MET), " 2nd International EUVL Workshop October 19-20, 2000, proceedings available from SEMATECH, Austin, TX.
5. P. Naulleau, K. Goldberg, P. Batson, J. Bokor, P. Denham, and S. Rekawa, "A Fourier-synthesis custom-coherence illuminator for EUV microfield lithography, " Appl. Opt. 42, 820-826 (2003).
6. G. Denbeaux, R. Garg, J. Waterman, Y. Fan, R. Brainard, C. Mbanaso, K. Dean, "Quantitative measurement of EUV resist outgassing, " 2006 International Symposium on Extreme Ultraviolet Lithography, Barcelona, Spain, October 15-18, 2006, proceedings available from SEMATECH, Austin, TX.