Theoretical analysis of energy degradation of electron in the resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7273, Issue , 2009, Pages

  Toriumi, Minoru ^a  

^a JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

EB lithography; Electron degradation; EUV lithography; Excitation; Ionization; Resist; Singlet; Triplet

Indexed keywords

EB LITHOGRAPHY; ELECTRON DEGRADATION; EUV LITHOGRAPHY; EXCITATION; RESIST; SINGLET; TRIPLET;

DEGRADATION; ELECTRIC EXCITATION; ELECTRON BEAM LITHOGRAPHY; ENERGY DISSIPATION; IONIZATION; MOLECULAR ORBITALS; MOLECULES; PHENOLS; ULTRAVIOLET DEVICES;

ELECTRONS;

EID: 65849391428     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.813940     Document Type: Conference Paper

References (6)

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5. Okazaki, K. and Sato, S., "Non-empirical Calculation of the G-Values for the Ionization and Excitations in Diatomic Molecules Irradiated by 100 keV Electrons," Bull. Chem. Soc. Jpn, 48, 3523 (1975).
6. Okazaki, K., Yamabe, M. and Sato, S., "The Theoretical Estimation of the G-Values for the Ionization and Excitation of Thirty-eight Gaseous Compounds Irradiated by 100 keV Electrons" , Bull. Chem. Soc. Jpn., 50, 1409 (1977).