Critical challenges for EUV resist materials

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7972, Issue , 2011, Pages

  Naulleau, Patrick P ^a   Anderson, Christopher N ^a   Baclea An, Lorie Mae ^a   Denham, Paul ^a   George, Simi ^a   Goldberg, Kenneth A ^a   Jones, Gideon ^a   McClinton, Brittany ^b   Miyakawa, Ryan ^b   Rekawa, Seno ^a   Smith, Nate ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Extreme ultraviolet; Lithography; Nanolithography; Photoresist

Indexed keywords

CHEMICALLY AMPLIFIED RESIST; CRITICAL CHALLENGES; EUV RESISTS; EXTREME ULTRAVIOLET; LINE EDGE ROUGHNESS; RESOLUTION REQUIREMENTS;

ELECTRON BEAM LITHOGRAPHY; PHOTORESISTS;

MATERIALS;

EID: 79955896836     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.882955     Document Type: Conference Paper

References (23)

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