Out of band radiation effects on resist patterning

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7969, Issue , 2011, Pages

  George, Simi A ^a,b   Naulleau, Patrick P ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b SCHOTT North America Inc   (United States)

Author keywords

aerial image modeling; blur; EUVL; flare; out of band; resists

Indexed keywords

AERIAL IMAGES; BLUR; EUVL; FLARE; OUT-OF-BAND; RESISTS;

LITHOGRAPHY;

RADIATION EFFECTS;

EID: 79955913310     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.881161     Document Type: Conference Paper

References (16)

1. Bakshi, V., ed., "EUV Sources for Lithography," SPIE Press, Washington (2005)
2. Gullikson, E., "Multilayer reflectivity," (2007).
3. Palik, E. D. and Ghosh, G., Handbook of Optical Constants of Solids, Academic Press, San Diego, CA (1997). http://henke.lbl.gov/optical-constants.
4. Roberts, J. M. Bristol, R. L., Younkin, T. R., Fedynyshyn, T. H., Astolfi, D. K., and Cabral, A., "Sensitivity of EUV resists to out-of-band radiation," Proc. SPIE 7273, 72731W (2009).
5. George, S. A., Naulleau, P. P., Rekawa, S., Gullikson, E., and Kemp, C. D., "Estimating the out-of-band radiation flare levels for extreme ultraviolet lithography," J. Micro/Nanolith. MEMS MOEMS 8, 041502 (2009)
6. Naulleau, P. P., Anderson, C. N., Chiu, J., Dean, K., Dehnam, P. E., George, S. A., Goldberg, K. A., Hoef, B. H., Jones, G., Koh, C., La Fontaine, B., Ma, A., Montgomery, W., Niakoula, D., Park, J.-O., Wallow, T. I., Wurm, S. "Latest results from the SEMATECH Berkeley extreme ultraviolet mircofield exposure tool," JVST B, 27, p. 66, (2009)
7. Naulleau, P. P., Gullikson, E. M., Aquila, A., George, S., and Niakoula, D., Absolute sensitivity calibration of extreme ultraviolet photoresists," Opt. Express 16(15), 11519-11524 (2008)
8. Miyake, A., Kanazawa, H., Banine, V., and Suzuki, K., Joint requirements," Presentation at EUV Work-shop, Proceedings available at www.sematech.org (October 19. 2006).
9. Mizuno, H., McIntyre, G., Koay, C-S., Burkhardt, M., LaFontaine, B., and Wood, O., "Flare evaluation of ASML alpha demo tool," Proc. SPIE 7271, 72710U (2009)
10. Panoramic Technology, "EM-Suite/Hyperlith," http://www.panoramictech.com (2009).
11. George, S. A., Naulleau, P. P., "Assessing out-of-band flare effects at the wafer level for EUV lithography", Proc. SPIE 7636, 763626 (2010).
12. LDLS™ Laser-Driven Light Sources, http://www.energetiq.com/html/ ldls.html
13. Acton Optics & Coatings, "Optical filters," (2009). http://www.princetoninstruments.com/products/optics/filters/default.aspx#1.
14. SXUV Series Photodiodes, http://www.ird-inc.com/sxuv.html
15. Hitachi High-Technologies, http://www.hht-eu.com/cms/3171.html
16. EUV Technology SuMMIT Software Division, http://www.lithometrix.com