Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography

Applied Optics

Volumn 42, Issue 5, 2003, Pages 820-826

  Naulleau, Patrick P ^a   Goldberg, Kenneth A ^a   Batson, Phil ^a   Bokor, Jeffrey ^a,b   Denham, Paul ^a   Rekawa, Senajith ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COHERENT LIGHT; DIFFRACTION; LITHOGRAPHY; PRINTING; SYNCHROTRON RADIATION;

ULTRAVIOLET MICROFIELD LITHOGRAPHY;

LIGHT SOURCES;

LIGHT SOURCES; LITHOGRAPHY; PRINTING; RADIATION;

EID: 0037428835     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.42.000820     Document Type: Article

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