Stochastic approach to modeling photoresist development

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 27, Issue 3, 2009, Pages 1122-1128

  MacK, Chris ^a  

^a NONE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

PERCOLATION (SOLID STATE); PHOTORESISTS; POLYMERS; SOLVENTS;

DEVELOPMENT PATH; DEVELOPMENT RATE; DISSOLUTION PATHS; DISSOLUTION RATES; INSOLUBLE POLYMERS; PERCOLATION PROBABILITY; PERCOLATION THEORY; PHOTORESIST DEVELOPMENT; POLYMER MOLECULE; STOCHASTIC APPROACH; THEORETICAL FRAMEWORK;

DISSOLUTION;

EID: 77953505796     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3117346     Document Type: Conference Paper

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