Kinetics, chemical modeling and lithography of novel acid amplifiers for use in EUV photoresists

Journal of Photopolymer Science and Technology

Volumn 22, Issue 1, 2009, Pages 43-50

  Brainard, Robert ^a   Kruger, Seth ^a   Higgins, Craig ^a   Revuru, Srividya ^a   Gibbons, Sarah ^b   Freedman, Dan ^b   Yueh, Wang ^c   Younkin, Todd ^c  

^a STATE UNIVERSITY OF NEW YORK   (United States)

^b STATE UNIVERSITY OF NEW YORK   (United States)

^c INTEL CORPORATION   (United States)

Author keywords

Acid amplifiers; Autocatalysis; EUV; Kinetics; Photoresists; Z parameter

Indexed keywords

EID: 70249091481     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.22.43     Document Type: Article

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