Effects of mask roughness and condenser scattering in EUVL systems

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3676, Issue II, 1999, Pages 653-662

  Beaudry, N A ^a   Milster, T D ^a  

^a UNIVERSITY OF ARIZONA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; LIGHT SCATTERING; MASKS; MIRRORS; MONTE CARLO METHODS; MULTILAYERS; OPTICAL FILMS; SURFACE ROUGHNESS; THIN FILMS;

CONDENSER MIRRORS; EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL);

PHOTOLITHOGRAPHY;

EID: 0032654746     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.351140     Document Type: Conference Paper

References (8)