Predictive linewidth roughness and CDU simulation using a calibrated physical stochastic resist model

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7639, Issue , 2010, Pages

  Robertson, Stewart A ^a   Biafore, John J ^a   Smith, Mark D ^a   Reilly, Michael T ^b   Wandell, Jerome ^b  

^a KLA Tencor Austin   (United States)

^b Dow Electronic Materials   (United States)

Author keywords

Line Edge Roughness (LER); LineWidth Roughness (LWR); PROLITH; Stochastic lithographic modeling

Indexed keywords

CALIBRATED MODEL; ELECTRONIC MATERIALS; EXPERIMENTAL DATA; EXPOSURE CONDITIONS; LINE EDGE ROUGHNESS; LINE END SHORTENINGS; LINEWIDTH ROUGHNESS; LITHOGRAPHY SIMULATION; PROLITH; RESIST MODELS; ROOT MEAN SQUARED ERRORS;

COMPUTER SIMULATION; LINEWIDTH; PHOTORESISTS; STOCHASTIC MODELS; STOCHASTIC SYSTEMS;

ROUGHNESS MEASUREMENT;

EID: 77953530681     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.846539     Document Type: Conference Paper

References (7)

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2. Robertson, S. A., Biafore J. J., Smith, M. D., Reilly, M. T., Wandell, J., "Validation of the predictive power of a calibrated physical stochastic resist model", Proc. SPIE 7520, (2009)
3. Biafore, J. J., Smith, M. D., Wallow, T., Naulleau, P., Blankenship, D,. Deng, Y., "Pattern prediction in EUV resist", proc. SPIE 7520, (2009)
4. Biafore, J. J., Robertson, S. A., Smith, M. D., Sallee, C., "The accuracy of a calibrated PROLITH physical resist model across illumination conditions", Proc SPIE 6521 (2007)
5. Robertson, S. A., Kim, B. S., Choi W. H., Kim Y. H., Biafore, J. J., Smith, M. D., "Evaluating the accuracy of a calibrated rigorous physical resist model under various process and illumination conditions", Proc. SPIE 6924 (2008)
6. Yong, L. H., Chun C. L., Chaing-Lin S., Biafore J. J., Roberson S. A., "Advantages of a calibrated physical resist model for pattern prediction", Proc. SPIE 6923 (2008)
7. Vasek, J. E., Chin-Min, Y., Biafore J. J., Robertson, S. A., "Site portability and extrapolative accuracy of a predictive resist model", Proc SPIE 6925, (2008)