The effects of nonlinear series resonance on Ohmic and stochastic heating in capacitive discharges

Physics of Plasmas

Volumn 15, Issue 6, 2008, Pages

  Lieberman, M A ^a   Lichtenberg, A J ^a   Kawamura, E ^a   Mussenbrock, Thomas ^b   Brinkmann, Ralf Peter ^b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BIAS CURRENTS; DISCHARGE (FLUID MECHANICS); FLUID MECHANICS; HEATING; LAWS AND LEGISLATION; METALLIZING; PRESSURE; RESONANCE; SIGNAL INTERFERENCE; STOCHASTIC PROGRAMMING;

AMERICAN INSTITUTE OF PHYSICS (AIP); CAPACITIVE DISCHARGES; DC BIAS VOLTAGE; ELECTRODE SURFACES; IN ORDER; ION CONDUCTION; LOWER PRESSURES; OARTICLE IN CELL (PIC) SIMULATION; OHMIC HEATING; PARTICLE IN CELL (PIC) SIMULATIONS; SELF EXCITATION; SERIES RESONANCE; STOCHASTIC HEATING;

STOCHASTIC MODELS;

EID: 43149089607     PISSN: 1070664X     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2928847     Document Type: Article

References (27)

1. F. Schneider, Z. Angew. Math. Phys. 6, 456 (1954).
2. J. Taillet, Am. J. Phys. 37, 423 (1969).
3. B. M. Annaratone, V. P. T. Ku, and J. E. Allen, J. Appl. Phys. 77, 5455 (1995).
4. V. P. T. Ku, B. M. Annaratone, and J. E. Allen, J. Appl. Phys. 0021-8979 10.1063/1.369025 84, 6536 (1998); V. P. T. Ku, B. M. Annaratone, and J. E. Allen, J. Appl. Phys. 84, 6546 (1998).
5. W. D. Qiu, K. J. Bowers, and C. K. Birdsall, Plasma Sources Sci. Technol. 12, 57 (2003).
6. O. A. Popov and V. A. Godyak, J. Appl. Phys. 57, 53 (1985).
7. V. A. Godyak, Soviet Radio Frequency Discharge Research (Delphic Associates, Falls Church, 1986).
8. M. A. Lieberman, IEEE Trans. Plasma Sci. 16, 638 (1988).
9. M. A. Lieberman, IEEE Trans. Plasma Sci. 17, 338 (1989).
10. V. A. Godyak and N. Sternberg, Phys. Rev. A 42, 2299 (1990).
11. M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing, 2nd ed. (Wiley, New York, 2005).
12. G. Gozadinos, M. M. Turner, and D. Vender, Phys. Rev. Lett. 87, 135004 (2001).
13. M. M. Turner, Phys. Rev. Lett. 75, 1312 (1995).
14. I. D. Kaganovich, Phys. Rev. Lett. 89, 265006 (2002).
15. G. R. Misium, A. J. Lichtenberg, and M. A. Lieberman, J. Vac. Sci. Technol. A A7, 1007 (1989).
16. B. P. Wood, J. Appl. Phys. 73, 4770 (1993).
17. B. P. Wood, M. A. Lieberman, and A. J. Lichtenberg, IEEE Trans. Plasma Sci. 19, 619 (1991).
18. T. Mussenbrock and R. P. Brinkmann, Appl. Phys. Lett. 88, 151503 (2006).
19. T. Mussenbrock, D. Ziegler, and R. P. Brinkmann, Phys. Plasmas 13, 083501 (2006).
20. T. Mussenbrock and R. P. Brinkmann, Plasma Sources Sci. Technol. 16, 377 (2007).
21. U. Czarnetzki, T. Mussenbrock, and R. P. Brinkmann, Phys. Plasmas 13, 123503 (2006).
22. A. Metze, D. W. Ernie, and H. J. Oskam, J. Appl. Phys. 60, 3081 (1986).
23. M. V. Alves, M. A. Lieberman, V. Vahedi, and C. K. Birdsall, J. Appl. Phys. 69, 3823 (1991).
24. J. P. Verboncoeur, M. V. Alves, V. Vahedi, and C. K. Birdsall, J. Comput. Phys. 104, 321 (1993).
25. V. Vahedi and M. Surendra, Comput. Phys. Commun. 87, 179 (1995).
26. E. Kawamura, M. A. Lieberman, and A. J. Lichtenberg, Phys. Plasmas 13, 053506 (2006).
27. M. M. Turner and P. Chabert, Phys. Rev. Lett. 96, 205001 (2006).