Improving the metallic content of focused electron beam-induced deposits by a scanning electron microscope integrated hydrogen-argon microplasma generator

Journal of Vacuum Science and Technology B

Volumn 28, Issue 4, 2010, Pages 744-750

  Miyazoe, Hiroyuki ^a,b   Utke, Ivo ^a   Kikuchi, Hirokazu ^a,b   Kiriu, Shinya ^a,b   Friedli, Vinzenz ^a   Michler, Johann ^a   Terashima, Kazuo ^b  

^a SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

^b Graduate School of Frontier Sciences   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CARBON; COPPER; COPPER COMPOUNDS; ELECTRON BEAMS; FIGHTER AIRCRAFT; HYDROGEN; HYDROGEN BONDS; MOLECULES; PLASMA DEVICES; PLASMA JETS; SCANNING ELECTRON MICROSCOPY;

ATOMIC HYDROGEN; BIAS POTENTIAL; CO-INJECTION; CU CONTENT; FOCUSED ELECTRON BEAMS; FOCUSED ELECTRON-BEAM-INDUCED DEPOSITIONS; INTEGRATED HYDROGEN; METALLIC CONTENT; MICRO-PLASMAS; SCANNING ELECTRONS;

DEPOSITS;

EID: 77957233461     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3449808     Document Type: Conference Paper

References (43)

1. S. J. Randolph, J. D. Fowlkes, and P. D. Rack, Crit. Rev. Solid State Mater. Sci. CCRSDA 1040-8436 31, 55 (2006). 10.1080/10408430600930438 (Pubitemid 44603985)
2. I. Utke, P. Hoffmann, and J. Melngailis, J. Vac. Sci. Technol. B JVTBD9 1071-1023 26, 1197 (2008). 10.1116/1.2955728
3. A. Botman, J. J. L. Mulders, and C. W. Hagen, Nanotechnology NNOTER 0957-4484 20, 372001 (2009). 10.1088/0957-4484/20/37/372001
4. H. Miyazoe, I. Utke, J. Michler, and K. Terashima, Appl. Phys. Lett. APPLAB 0003-6951 92, 043124 (2008). 10.1063/1.2839334 (Pubitemid 351198879)
5. W. F. van Dorp, B. van Someren, C. W. Hagen, and P. Kruit, Nano Lett. NALEFD 1530-6984 5, 1303 (2005). 10.1021/nl050522i (Pubitemid 41084407)
6. J. Fujita, M. Ishida, T. Ichihashi, Y. Ochiai, T. Kaito, and S. Matsui, J. Vac. Sci. Technol. B JVTBD9 1071-1023 21, 2990 (2003). 10.1116/1.1624259
7. C. Schössler, J. Urban, and H. W. P. Koops, J. Vac. Sci. Technol. B JVTBD9 1071-1023 15, 1535 (1997). 10.1116/1.589394
8. I. Utke, T. Bret, D. Laub, P. Buffat, L. Scandella, and P. Hoffmann, Microelectron. Eng. MIENEF 0167-9317 73-74, 553 (2004). 10.1016/S0167-9317(04) 00138-8
9. T. Bret, S. Mauron, I. Utke, and P. Hoffmann, Microelectron. Eng. MIENEF 0167-9317 78-79, 300 (2005). 10.1016/j.mee.2005.01.006 (Pubitemid 40370976)
10. I. Utke, J. Michler, P. Gasser, C. Santschi, D. Laub, M. Cantoni, P. A. Buffat, C. Jiao, and P. Hoffmann, Adv. Eng. Mater. AENMFY 1438-1656 7, 323 (2005). 10.1002/adem.200500061 (Pubitemid 40822276)
11. M. Weber, H. W. P. Koops, M. Rudolph, J. Kretz, and G. Schmidt, J. Vac. Sci. Technol. B JVTBD9 1071-1023 13, 1364 (1995). 10.1116/1.587854
12. A. Botman, M. Hesselberth, and J. J. L. Mulders, Microelectron. Eng. MIENEF 0167-9317 85, 1139 (2008). 10.1016/j.mee.2007.12.036
13. A. Botman, J. J. L. Mulders, R. Weemaes, and S. Mentink, Nanotechnology NNOTER 0957-4484 17, 3779 (2006). 10.1088/0957-4484/17/15/028 (Pubitemid 44424412)
14. K. Mølhave, D. N. Madsen, A. M. Rasmussen, A. Carlsson, C. C. Appel, M. Brorson, C. J. H. Jacobsen, and P. Boggild, Nano Lett. NALEFD 1530-6984 3, 1499 (2003). 10.1021/nl034528o (Pubitemid 37518160)
15. D. N. Madsen, K. Molhave, R. Mateiu, A. M. Rasmussen, M. Brorson, C. J. H. Jacobsen, and P. Boggild, Nano Lett. NALEFD 1530-6984 3, 47 (2003). 10.1021/nl0257972 (Pubitemid 37161851)
16. K. Mølhave, D. N. Madsen, S. Dohn, and P. Boggild, Nanotechnology NNOTER 0957-4484 15, 1047 (2004). 10.1088/0957-4484/15/8/033
17. A. Folch, J. Tejada, C. H. Peters, and M. S. Wrighton, Appl. Phys. Lett. APPLAB 0003-6951 66, 2080 (1995). 10.1063/1.113909
18. A. Folch, J. Servat, J. Esteve, J. Tejada, and M. Seco, J. Vac. Sci. Technol. B JVTBD9 1071-1023 14, 2609 (1996). 10.1116/1.588994
19. I. Utke, P. Hoffmann, B. Dwir, K. Leifer, E. Kapon, and P. Doppelt, J. Vac. Sci. Technol. B JVTBD9 1071-1023 18, 3168 (2000). 10.1116/1.1319690 (Pubitemid 32088177)
20. J. D. Barry, M. Ervin, J. Molstad, A. Wickenden, T. Brintlinger, P. Hoffman, and J. Meingailis, J. Vac. Sci. Technol. B JVTBD9 1071-1023 24, 3165 (2006). 10.1116/1.2395962 (Pubitemid 44866489)
21. A. Perentes, G. Sinicco, G. Boero, B. Dwir, and P. Hoffmann, J. Vac. Sci. Technol. B JVTBD9 1071-1023 25, 2228 (2007). 10.1116/1.2794071 (Pubitemid 350255872)
22. I. Utke, A. Luisier, P. Hoffmann, D. Laub, and P. A. Buffat, Appl. Phys. Lett. APPLAB 0003-6951 81, 3245 (2002). 10.1063/1.1517180 (Pubitemid 35360552)
23. Y. Kakefuda, Y. Yamashita, K. Mukai, and J. Yoshinobu, Surf. Sci. SUSCAS 0039-6028 601, 5108 (2007). 10.1016/j.susc.2007.04.148 (Pubitemid 350046697)
24. T. Lukasczyk, M. Schirmer, H. P. Steinruck, and H. Marbach, Small SMALBC 1613-6810 4, 841 (2008). 10.1002/smll.200701095 (Pubitemid 352007151)
25. A. Luisier, I. Utke, T. Bret, F. Cicoira, R. Hauert, S. W. Rhee, P. Doppelt, and P. Hoffmann, J. Electrochem. Soc. JESOAN 0013-4651 151, C535 (2004). 10.1149/1.1765680
26. R. L. Carlson, IEEE J. Quantum Electron. IEJQA7 0018-9197 17, 1662 (1981). 10.1109/JQE.1981.1071309
27. R. A. Gerber, E. L. Patterson, L. S. Blair, and N. R. Greiner, Appl. Phys. Lett. APPLAB 0003-6951 25, 281 (1974). 10.1063/1.1655473
28. C. B. Edwards, F. Oneill, and M. J. Shaw, Appl. Phys. Lett. APPLAB 0003-6951 38, 843 (1981). 10.1063/1.92213
29. M. Ryoji, T. Hara, K. Ohnishi, M. Hamagaki, Y. Dake, M. Tohkai, and Y. Aoyagi, Jpn. J. Appl. Phys., Part 2 JAPLD8 0021-4922 31, 4357 (1992). 10.1143/JJAP.31.4357
30. T. Aida, A. Tsukamoto, K. Imagawa, T. Fukazawa, S. Saito, K. Shindo, K. Takagi, and K. Miyauchi, Jpn. J. Appl. Phys., Part 2 JAPLD8 0021-4922 28, L635 (1989). 10.1143/JJAP.28.L635
31. J. Voigt, F. Shi, K. Edinger, P. Güthner, and I. W. Rangelow, Microelectron. Eng. MIENEF 0167-9317 57-58, 1035 (2001).
32. K. Tachibana, IEEJ Trans., Electr. Electron. Eng. 1, 145 (2006). 10.1002/tee.20031
33. A. C. Bose, Y. Shimizu, D. Mariotti, T. Sasaki, K. Terashima, and N. Koshizaki, Nanotechnology NNOTER 0957-4484 17, 5976 (2006). 10.1088/0957-4484/ 17/24/012 (Pubitemid 46069932)
34. H. Miyazoe, M. Sai, S. Stauss, and K. Terashima, J. Vac. Sci. Technol. A JVTAD6 0734-2101 27, 9 (2009). 10.1116/1.3010716
35. J. Geddes, R. W. McCullough, A. Donnelly, and H. B. Gilbody, Plasma Sources Sci. Technol. PSTEEU 0963-0252 2, 93 (1993). 10.1088/0963-0252/2/2/004
36. L. Reimer, M. Kassens, and L. Wiese, Microchim. Acta [Suppl.] 13, 485 (1996).
37. R. Yamada, J. Nucl. Mater. JNUMAM 0022-3115 145-147, 359 (1987). 10.1016/0022-3115(87)90360-6 (Pubitemid 17597333)
38. E. Vietzke, V. Philipps, K. Flaskamp, P. Koidl, and C. Wild, Surf. Coat. Technol. SCTEEJ 0257-8972 47, 156 (1991). 10.1016/0257-8972(91)90277-4 (Pubitemid 21710952)
39. E. Vietzke, K. Flaskamp, V. Philipps, G. Esser, P. Wienhold, and J. Winter, J. Nucl. Mater. JNUMAM 0022-3115 145-147, 443 (1987). 10.1016/0022-3115(87)90378-3 (Pubitemid 17597315)
40. T. Aoki, S. Chiba, J. Matsuo, I. Yamada, and J. P. Biersack, Nucl. Instrum. Methods Phys. Res. B NIMBEU 0168-583X 180, 312 (2001). 10.1016/S0168-583X(01)00437-2 (Pubitemid 32594497)
41. C. Hopf, A. von Keudell, and W. Jacob, J. Appl. Phys. JAPIAU 0021-8979 94, 2373 (2003). 10.1063/1.1594273
42. V. Friedli, C. Santschi, J. Michler, P. Hoffmann, and I. Utke, Appl. Phys. Lett. APPLAB 0003-6951 90, 053106 (2007). 10.1063/1.2435611 (Pubitemid 46245891)
43. Z. Sitar, M. J. Paisley, D. K. Smith, and R. F. Davis, Rev. Sci. Instrum. RSINAK 0034-6748 61, 2407 (1990). 10.1063/1.1141371