Molecular dynamics and Monte-Carlo simulation of sputtering and mixing by ion irradiation

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 180, Issue 1-4, 2001, Pages 312-316

  Aoki, T ^a   Chiba, S ^a   Matsuo, J ^a   Yamada, I ^a   Biersack, J P ^b  

^a KYOTO UNIVERSITY   (Japan)

^b HAHN MEITNER INSTITUT   (Germany)

Author keywords

Ion mixing; Molecular dynamics simulation; Monte Carlo simulation; SIMS resolution; Sputtering

Indexed keywords

ARGON; COMPUTER SIMULATION; ION BOMBARDMENT; MIXING; MOLECULAR DYNAMICS; MONTE CARLO METHODS; SECONDARY ION MASS SPECTROMETRY; SPUTTERING;

DEPTH PROFILING; ION MIXING;

SILICON;

EID: 0035363542     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(01)00437-2     Document Type: Conference Paper

References (6)