Fundamental aspects of substrate biasing: Ion velocity distributions and nonlinear effects

Journal of Physics D: Applied Physics

Volumn 43, Issue 33, 2010, Pages

  Baloniak, Tim ^a   Reuter, Rüdiger ^a   Von Keudell, Achim ^a  

^a RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODE VOLTAGE; EXPERIMENTAL DATA; FAST FOURIER TRANSFORMATIONS; FREQUENCY DOMAINS; FULL CONTROL; ION VELOCITY DISTRIBUTION; ION VELOCITY DISTRIBUTION FUNCTION; NONLINEAR EFFECT; PLASMA PROCESSING; RF BIAS; SHEATH VOLTAGE; SUBSTRATE BIASING; SYSTEM RESPONSE; THIN-FILM DEPOSITIONS; WAVE FORMS;

BIAS VOLTAGE; DEPOSITION; DISTRIBUTION FUNCTIONS; FOURIER ANALYSIS; IONS; PLASMA DEPOSITION; PLASMA ETCHING; VELOCITY CONTROL; VELOCITY DISTRIBUTION;

ION BOMBARDMENT;

EID: 77957113620     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/43/33/335201     Document Type: Article

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