Ion energy distributions versus frequency and ion mass at the rf-biased electrode in an inductively driven discharge

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 20, Issue 5, 2002, Pages 1759-1768

  Abraham, I C ^a   Woodworth, J R ^a   Riley, M E ^a   Miller, P A ^a   Hamilton, T W ^a   Aragon, B P ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; ELECTRODES; FREQUENCIES; HEAVY IONS; INERT GASES; PLASMA OSCILLATIONS;

ION ENERGY DISTRIBUTIONS (IED);

INDUCTIVELY COUPLED PLASMA;

EID: 0036747662     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1502693     Document Type: Article

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