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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 20, Issue 3, 2002, Pages 873-886

Ion energy distributions at rf-biased wafer surfaces

(8) Woodworth, J R a Abraham, I C a Riley, M E a Miller, P A a Hamilton, T W a Aragon, B P a Shul, R J a Willison, C G b

a SANDIA NATIONAL LABORATORIES (United States)

b L and M Technologies (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GRIDDED ENERGY ANALYZER; ION ENERGY DISTRIBUTION; WAFER SURFACE;

ARGON; ELECTRODES; FREQUENCIES; IONS; SURFACE STRUCTURE;

SILICON WAFERS;

EID: 0036565064 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1472421 Document Type: Article

Times cited : (43)

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