Control of the radio-frequency wave form at the chuck of an industrial oxide-etch reactor

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 6, 2000, Pages 2806-2814

  Berry, Lee ^a   Maynard, Helen ^b   Miller, Paul ^c   Moore, Tony ^a,d   Pendley, Michael ^d   Resta, Victoria ^d,e   Sparks, Dennis ^a   Yang, Qingyun ^d,f  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

^b LUCENT TECHNOLOGIES   (United States)

^c SANDIA NATIONAL LABORATORIES   (United States)

^d SEMATECH   (United States)

^e HEWLETT PACKARD COMPANY   (United States)

^f IBM   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONTROL SYSTEMS; INDUSTRIAL APPLICATIONS; MICROELECTRONICS;

INDUSTRIAL OXIDE ETCH REACTORS; PLASMA REACTORS;

PLASMA ETCHING;

EID: 0034315704     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1319819     Document Type: Article

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