Modeling of the sheath and the energy distribution of ions bombarding rf-biased substrates in high density plasma reactors and comparison to experimental measurements

Journal of Applied Physics

Volumn 86, Issue 9, 1999, Pages 4799-4812

  Edelberg, Erik A ^a   Aydil, Eray S ^a  

^a University of California   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0008284330     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.371446     Document Type: Review

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