Surface patterning: Silicon falls into line

Nature Nanotechnology

Volumn 3, Issue 4, 2008, Pages 185-186

  Bent, Stacey F ^a  

^a Stanford University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY;

DIRECTED SELF-ASSEMBLY; ONE-DIMENSIONAL NANOSTRUCTURE; SURFACE PATTERNING;

SILICON;

GRAPHITE; HYDROGEN; NANOMATERIAL; SILICON;

ADSORPTION; BINDING SITE; CALCULATION; CHEMICAL STRUCTURE; ELECTRONICS; HYDROGEN BOND; HYDROPHOBICITY; MOLECULAR INTERACTION; PRIORITY JOURNAL; SHORT SURVEY; STRUCTURE ANALYSIS; TECHNOLOGY;

EID: 41849109111     PISSN: 17483387     EISSN: 17483395     Source Type: Journal    
DOI: 10.1038/nnano.2008.79     Document Type: Short Survey

References (9)

1. Whitesides, G. M. & Grzybowski, B. Science 295, 2418-2421 (2002).
2. Harikumar, K. R. et al. Nature Nanotech. 3, 222-228 (2008).
3. Bent, S. F. ACS Nano 1, 10-12 (2007).
4. Lopinski, G. P., Wayner, D. D. M. & Wolkow, R. A. Nature 406, 48-51 (2000).
5. Hossain, M. Z., Kato, H. S. & Kawai, M. J. Phys. Chem. B 109, 23129-23133 (2005).
6. Queeney, K. T., Chabal, Y. J. & Raghavachari, K. Phys. Rev. Lett. 86, 1046-1049 (2001).
7. Widjaja, Y. & Musgrave, C. B. Surf. Sci. 469, 9-20 (2000).
8. Wang, Y. & Hwang, G. S. J. Chem. Phys. 122, 164706 (2005).
9. Hossain, M. Z., Yamashita, Y. Mukai, K. & Yoshinobu, J. Phys. Rev. B 68, 235322 (2003).