Reaction of a hydrogen-terminated Si(100) surface in UHV with ion-pump generated radicals

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 27, Issue 2, 2009, Pages 248-252

  Zikovsky, Janik ^a   Dogel, Stanislav A ^a   Dickie, Adam J ^b   Pitters, Jason L ^b   Wolkow, Robert A ^a,b  

^a UNIVERSITY OF ALBERTA   (Canada)

^b NATIONAL RESEARCH COUNCIL CANADA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC SPECTROSCOPY; BUTADIENE; DANGLING BONDS; GETTERS; HELIUM; HYDROGEN; HYDROGEN BONDS; MASS SPECTROMETRY; SCANNING TUNNELING MICROSCOPY; SILICON; ULTRAHIGH VACUUM; VACUUM PUMPS;

ATOMIC HYDROGENS; CONCENTRATION OF; ION PUMPS; MASS SPECTRUM; MOLECULAR LINES; MOLECULAR RADICALS; NOBLE GAS; REACTIVE SITES; SI(100) SURFACE; ULTRAHIGH VACUUM CHAMBERS;

IONS;

EID: 61449246505     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3071944     Document Type: Article

References (13)

1. J. W. Lyding, G. C. Abeln, T. C. Shen, C. Wang, and J. R. Tucker, J. Vac. Sci. Technol. B 1071-1023 10.1116/1.587433 12, 3735 (1994).
2. S. R. Schofield, N. J. Curson, M. Y. Simmons, F. J. Ruess, T. Hallam, L. Oberbeck, and R. G. Clark, Phys. Rev. Lett. 0031-9007 10.1103/PhysRevLett.91. 136104 91, 136104 (2003).
3. G. P. Lopinski, D. D. M. Wayner, and R. A. Wolkow, Nature 406, 48 (2000).
4. T. R. Leftwich and A. V. Teplyakov, Surf. Sci. Rep. 63, 1 (2008). 0167-5729
5. S. A. Dogel, G. A. DiLabio, J. Zikovsky, J. L. Pitters, and R. A. Wolkow, J. Phys. Chem. C 111, 11965 (2007). 1932-7447
6. J. L. Pitters, I. Dogel, G. A. DiLabio, and R. A. Wolkow, J. Phys. Chem. B 1089-5647 10.1021/jp055153t 110, 2159 (2006).
7. J. Zikovsky, S. A. Dogel, A. B. Haider, G. A. DiLabio, and R. A. Wolkow, J. Phys. Chem. A 111, 12257 (2007). 1089-5639
8. M. Z. Hossain, H. S. Kato, and M. Kawai, J. Phys. Chem. B 109, 23129 (2005). 1520-6106
9. J. J. Boland, Surf. Sci. 0039-6028 10.1016/0039-6028(92)90214-Q 261, 17 (1992).
10. J. Zikovsky, S. A. Dogel, S. Sinha, G. A. DiLabio, and R. A. Wolkow, Chem. Phys. Lett. 458, 117 (2008). 0009-2614
11. NIST, NIST Chemistry WebBook, http://webbook.nist.gov/chemistry/, 2008.
12. M. H. Hablanian, High-Vacuum Technology: A practical guide, 2nd ed. (Dekker, New York, 1997).
13. I. A. Dogel, S. A. Dogel, J. L. Pitters, G. A. DiLabio, and R. A. Wolkow, Chem. Phys. Lett. 448, 237 (2007). 0009-2614