High-k Hf-based layers grown by RF magnetron sputtering

Nanotechnology

Volumn 21, Issue 9, 2010, Pages

  Khomenkova, L ^a   Dufour, C ^a   Coulon, P E ^b   Bonafos, C ^b   Gourbilleau, F ^a  

^a UNIVERSITÉ DE CAEN   (France)

^b CEMES CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS CARBON; AMORPHOUS FILMS; DEPOSITION; HAFNIUM; INFRARED SPECTROSCOPY; STABILITY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

AMORPHOUS STRUCTURES; ANNEALING TREATMENTS; ATTENUATED TOTAL REFLECTION INFRARED SPECTROSCOPY; CRYSTALLINE PHASE TRANSITION; DEPOSITION PARAMETERS; RF-MAGNETRON SPUTTERING; STRUCTURAL STABILITIES; THICKNESS OF THE FILM;

MAGNETRON SPUTTERING;

EID: 77953019624     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/21/9/095704     Document Type: Article

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