HfO2-SiO2 interface in PVD coatings

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 5, 2001, Pages 2267-2271

  Cosnier, V ^a   Olivier, M ^a   Theret G ^a   Andre B ^a  

^a CEA LETI   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; HAFNIUM COMPOUNDS; INFRARED RADIATION; INTERFACES (MATERIALS); ION BEAM ASSISTED DEPOSITION; LIGHT REFLECTION; MICROELECTRONICS; MOS DEVICES; PHYSICAL VAPOR DEPOSITION; SILICA; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTRON BEAM EVAPORATION; MULTIPLE INTERNAL REFLECTION (MIR) TECHNIQUE;

INORGANIC COATINGS;

EID: 0035526801     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1382879     Document Type: Article

References (11)