Transmission electron microscopy studies of HfO 2 thin films grown by chloride-based atomic layer deposition

Applied Surface Science

Volumn 253, Issue 2, 2006, Pages 606-617

  Mitchell, D R G ^a   Aidla, A ^b   Aarik, J ^b  

^a AUSTRALIAN NUCLEAR SCIENCE AND TECHNOLOGY ORGANISATION   (Australia)

^b UNIVERSITY OF TARTU   (Estonia)

Author keywords

ALD; Atomic layer deposition; HfO 2; TEM; Thin film deposition

Indexed keywords

DEPOSITION; FILM GROWTH; GRAIN SIZE AND SHAPE; HAFNIUM COMPOUNDS; NUCLEATION; TRANSMISSION ELECTRON MICROSCOPY;

ATOMIC LAYER DEPOSITION (ALD); HFO2; INTERFACIAL LAYERS; THIN FILM DEPOSITION;

THIN FILMS;

EID: 33845446722     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.12.133     Document Type: Article

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