Chemically amplified photosensitive polylmides and polybenzoxazoles

Journal of Photopolymer Science and Technology

Volumn 22, Issue 6, 2010, Pages 761-771

  Fukukawa, Ken Ichi ^a   Ueda, Mitsuru ^b  

^a MITSUI CHEMICALS INC   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Chemical amplification; Photoacid generator; Photobase generator; Photosensitive polybenzoxazole; Photosensitive polyimide

Indexed keywords

EID: 77952173886     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.22.761     Document Type: Article

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