Three components positive type photosensitive poly(benzoxazole) based on poly(o-hydroxy amide), a dissolution inhibitor and a photo acid generator

Journal of Photopolymer Science and Technology

Volumn 19, Issue 2, 2006, Pages 291-292

  Ogura, Tomohito ^a   Ueda, Mitsuru ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Dissolution contrast; Dissolution inhibitors; Low k materials; Photosensitive polymer; Poly(o hydroxy amide); Polybenzoxazole

Indexed keywords

EID: 33747428362     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.19.291     Document Type: Article

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