Positive-type photosensitive polyimide based on poly(amide acid), vinyl ether crosslinker, and a photoacid generator

Journal of Photopolymer Science and Technology

Volumn 21, Issue 1, 2008, Pages 119-123

  Okazaki, Masaki ^a   Onishi, Hitoshi ^a   Yamashita, Wataru ^a   Tamai, Shoji ^a  

^a MITSUI CHEMICALS INC   (Japan)

Author keywords

Crosslinking dissolution inhibitor; Flexural endurance; Photoacid generator; Positive type

Indexed keywords

EID: 49049119082     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.21.119     Document Type: Article

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