Direct patterning of poly(amic acid) and low-temperature imidization using a crosslinker, a photoacid generator, and a thermobase generator

Journal of Polymer Science, Part A: Polymer Chemistry

Volumn 47, Issue 13, 2009, Pages 3362-3369

  Ogura, Tomohito ^a   Higashihara, Tomoya ^a   Ueda, Mitsuru ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Low temperature imidization; Photoacid generator; Photoresists; Photosensitive polymer; Poly(amic acid); Polycondensation; Polyimides; Positive type; Positive type photosensitive polyimide

Indexed keywords

LOW-TEMPERATURE IMIDIZATION; PHOTOACID GENERATOR; PHOTOSENSITIVE POLYMER; POLY(AMIC ACID); POSITIVE-TYPE; POSITIVE-TYPE PHOTOSENSITIVE POLYIMIDE;

ACETONITRILE; ACIDS; CARBOXYLATION; DIMETHYL SULFOXIDE; ETHANE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MICROELECTRONICS; NEMATIC LIQUID CRYSTALS; NITROGEN COMPOUNDS; PHOTORESISTORS; PHOTORESISTS; PHOTOSENSITIVITY; POLYCONDENSATION; POLYIMIDES; SURFACE TREATMENT;

LIGHT SENSITIVE MATERIALS;

EID: 67650076856     PISSN: 0887624X     EISSN: 10990518     Source Type: Journal    
DOI: 10.1002/pola.23411     Document Type: Article

References (35)

1. Rubner, R.; Ahne, H.; Kühn, E.; Koloddieg G. Photogr Sci Eng 1979, 23, 303-309.
2. Mochizuki, A.; Ueda, M. J Photopolym Sci Tech-nol 2001, 14, 677-687.
3. Matsuoka, Y.; Yokota, K.; Ogitani, S.; Ikeda, A.; Takahashi, H.; Ai, H. Polym Eng Sci 1992, 32, 1618-1622.
4. Yoda, N.; Hiramoto, H. J Macromol Sci Chem 1984, A21, 1641-1663.
5. Zhang, A.; Li, X.; Nah, C.; Hwang, K.; Lee, M. H. J Polym Sci Part A: Polym Chem 2003, 41, 22-29.
6. Ueda, M.; Nakayama, T. Macromolecules 1996, 29, 6427-6431.
7. Watanabe, Y.; Fukukawa, K.; Shibasaki, Y.; Ueda, M. J Polym Sci Part A: Polym Chem 2005, 43, 593-599.
8. Shin, G. J.; Jung, J. C.; Chi, J. H.; Oh, T. H.; Kim, J. B. J Polym Sci Part A: Polym Chem 2007, 45, 776-788.
9. Omote, T.; Mochizuki, H.; Koseki, K.; Yamaoka, T. Macromolecules 1990, 23, 4796-4802.
10. Mochizuki, A.; Teranishi, T.; Ueda, M. Polym J 1994, 26, 315-323.
11. Mochizuki, A.; Teranishi, T.; Ueda, M.; Matsushita, K. Polymer 1995, 36, 2153-2158.
12. Nakayama, T.; Mochizuki, A.; Ueda, M. React Funct Polym 1996, 30, 109-115.
13. Nakano, T.; Iwasawa, H.; Miyagawa, N.; Taka-hara, S.; Yamaoka, T. J Photopolym Sci Technol 2000, 13, 715-718.
14. Moss, M. G.; Cuzman, R. M.; Brewer, T. Proc SPIE Soc Opt Instr Eng 1989, 1086, 396-405.
15. Hayase, S.; Takano, K.; Mikogami, Y.; Nakano, Y. J Electrochem Soc 1991, 138, 3625-3629.
16. Omote, T.; Yamaoka, T. Polym Eng Sci 1992, 32, 1634-1641.
17. McKean, D. R.; Wallraff, G. M.; Volksen, W.; Hacker, N. P.; Sanchez, M. I.; Labadie, J. W. In Polymers for Microelectronics, Resist and Dielectrics; Tompson, L. F.; Willson C. G.; Tagawa, S., Eds, ACS Symp Ser 1994, 537, 403-416.
18. Mochizuki, A.; Teranishi, T.; Ueda, M. Macromole-cules 1995, 28, 365-369.
19. Rohde, O.; Smolka, P.; Falcigno, P. A.; Pfeifer, J. Polym Eng Sci 1992, 32, 1623-1629.
20. Fukushima, T.; Oyama, T.; Iijima, T.; Tomoi, M.; Itatani H. J Polym Sci Part A: Polym Chem 2001, 39, 3451-3463.
21. Pyo, S. H.; Lee, M. Y.; Jeon, J. J.; Lee, J. H.; Yi, M. H.; Kim, J. S. Adv Funct Mater 2005, 15, 619-626.
22. Watanabe, Y.; Shibasaki, Y.; Ando, S.; Ueda, M. Polym J 2005, 37, 270-276.
23. Sakayori, K.; Shibasaki, Y.; Ueda, M. Polym J 2006, 38, 1189-1193.
24. Gonzalo, B.; Vilas, J. L.; Breczewski, T.; Pérez-Jubindo, M. A.; De La Fuente, M. R.; Rodriguez, M.; León, L. M. J Polym Sci Part A: Polym Chem 2009, 47, 722-730.
25. Lin, C. H.; Lin, C. H. J Polym Sci Part A: Polym Chem 2007, 45, 2897-2912.
26. Fukukawa, K.; Shibasaki, Y.; Ueda, M. Polym Adv Technol 2006, 17, 131-136.
27. Fukukawa, K.; Shibasaki, Y.; Ueda, M. Polym J 2005, 37, 74-81.
28. Fukukawa, K.; Shibasaki, Y.; Ueda, M. Macromolecules 2004, 37, 8256-8261.
29. Okazaki, M.; Onishi, H.; Yamashita, W.; Tamai, S. J Photopolym Sci Technol 2006, 19, 277-280.
30. Sandler, S. R.; Karo, W. Organic Functional Group Preparation; Academic Press: New York, 1971; Vol. 2, p 223.
31. Lin, Q.; Steinhäusler, T.; Simpson, L.; Wilder, M.; Medeiros, D. R.; Wilson, C. G. Chem Mater 1997, 9, 1725-1730.
32. Havard, J. M.; Yoshida, M.; Pasini, D.; Vladimirov, N.; Frechet, J. M. J.; Medeiros, D. R.; Patterson, K.; Yamada, S.; Willson, C. G.; Byers, J. D. J Polym Sci Part A: Polym Chem 1999, 37, 1225-1236.
33. Ito, H. Adv Polym Sci 2005, 172, 37-245.
34. Fukukawa, K.; Ogura, T.; Shibasaki, Y.; Ueda, M. Chem Lett 2005, 34, 1372-1373.
35. Mizoguchi, K.; Ueda, M. J Polym Sci Part A: Polym Chem 2008, 46, 4949-4958.