Recent progress of photosensitive polyimides

Polymer Journal

Volumn 40, Issue 4, 2008, Pages 281-296

  Fukukawa, Ken Ichi ^a   Ueda, Mitsuru ^b  

^a MITSUI CHEMICALS INC   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Diazoaaphthoquinone; Low temperature imidization; Photoacid generator; Photobase generator; Photochemical amplification; Photosensitive compound; Photosensitive polyimide; Poly(amic acid)

Indexed keywords

BUILDING MATERIALS; MICROELECTRONIC PROCESSING; NUMERICAL METHODS; OPTICAL PROPERTIES; PHOTOPOLYMERS; PHOTOSENSITIVITY; PIGMENTS; POLYIMIDES; POLYMERS;

CONVENTIONAL METHODS; IMIDIZATION; LOW DIELECTRIC CONSTANT (LKD); MICROELECTRONIC INDUSTRY; NEGATIVE-WORKING; PATTERN FORMATIONS; PHOTOSENSITIVE POLYIMIDES (PSPI); POLYMER SCIENCE;

LIGHT SENSITIVE MATERIALS;

EID: 44949102227     PISSN: 00323896     EISSN: 13490540     Source Type: Journal    
DOI: 10.1295/polymj.PJ2007178     Document Type: Review

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