Development of negative-type photosensitive polyimide, based on poly(amic acid)s, photo base generator and thermal base generator

Journal of Photopolymer Science and Technology

Volumn 21, Issue 1, 2008, Pages 125-130

  Ogura, Tomohito ^a   Mizoguchi, Katsuhisa ^a   Ueda, Mitsuru ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Photobase generator; Photosensitive polymer; Polyimides; Thermal base generator

Indexed keywords

EID: 49049083860     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.21.125     Document Type: Article

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