Photosensitive polyimide using a highly sensitive photobase generator

Journal of Photopolymer Science and Technology

Volumn 22, Issue 3, 2009, Pages 391-392

  Fukuda, Shunji ^a   Katayama, Mami ^a   Sakayori, Katsuya ^a  

^a DAI NIPPON PRINTING CO LTD   (Japan)

Author keywords

Photo resist; Photobase generator; Photosensitive polymer; Polyimides

Indexed keywords

EID: 77952206157     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.22.391     Document Type: Article

References (3)

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3. A. Mochizuki, T. Teranishi, and M. Ueda, Macromolecules, 28, 365-369 (1995)