-
1
-
-
84893934458
-
Key messages from the international roadmap committee
-
"Key messages from the International Roadmap Committee," International Technology Roadmap for Semiconductors (2007), http://www.itrs.net/ news.html
-
(2007)
International Technology Roadmap for Semiconductors
-
-
-
2
-
-
37149024790
-
Extreme ultraviolet lithography: A review
-
B. Wu and A. Kumar, "Extreme ultraviolet lithography: a review," J. Vac. Sci. Technol. B 25, 1743-1761 (2007).
-
(2007)
J. Vac. Sci. Technol. B
, vol.25
, pp. 1743-1761
-
-
Wu, B.1
Kumar, A.2
-
3
-
-
84953675274
-
Fabrication of high-reflectance Mo-Si multilayer mirrors by planar-magnetron sputtering
-
D. G. Stearns and R. S. Rosen, "Fabrication of high-reflectance Mo-Si multilayer mirrors by planar-magnetron sputtering," J. Vac. Sci. Technol. 9, 2662-2669 (1991).
-
(1991)
J. Vac. Sci. Technol.
, vol.9
, pp. 2662-2669
-
-
Stearns, D.G.1
Rosen, R.S.2
-
4
-
-
0032403818
-
Multilayer reflective coatings for extreme ultraviolet lithography
-
C. Montcalm, S. Bajt, P. B. Mirkarimi, E. Spiller, F. J. Weber, and J. A. Folta, "Multilayer reflective coatings for extreme ultraviolet lithography," Proc. SPIE 3331, 42-51 (1998).
-
(1998)
Proc. SPIE
, vol.3331
, pp. 42-51
-
-
Montcalm, C.1
Bajt, S.2
Mirkarimi, P.B.3
Spiller, E.4
Weber, F.J.5
Folta, J.A.6
-
5
-
-
0036671788
-
Improved reflectance and stability of Mo/Si multilayers
-
S. Bajt, J. B. Alameda, J. T. W. Barbee, W. M. Clift, J. A. Folta, B. B. Kaufmann, and E. A. Spiller, "Improved reflectance and stability of Mo/Si multilayers," Opt. Eng. 41, 1797-1804 (2002).
-
(2002)
Opt. Eng.
, vol.41
, pp. 1797-1804
-
-
Bajt, S.1
Alameda, J.B.2
Barbee, J.T.W.3
Clift, W.M.4
Folta, J.A.5
Kaufmann, B.B.6
Spiller, E.A.7
-
6
-
-
0036566897
-
Optics developments in the VUV-soft x-ray spectral region
-
T. Feigl, J. Heber, A. Gatto, and N. Kaiser, "Optics developments in the VUV-soft x-ray spectral region," Nucl. Instrum. Methods Phys. Res. A 483, 351-356 (2002).
-
(2002)
Nucl. Instrum. Methods Phys. Res. A
, vol.483
, pp. 351-356
-
-
Feigl, T.1
Heber, J.2
Gatto, A.3
Kaiser, N.4
-
7
-
-
0020834662
-
Relationship of the total integrated scattering from multilayer-coated optics to angle of incidence, polarization, correlation length, and roughness cross-correlation properties
-
J. M. Elson, J. P. Rahn, and J. M. Bennett, "Relationship of the total integrated scattering from multilayer-coated optics to angle of incidence, polarization, correlation length, and roughness cross-correlation properties," Appl. Opt. 22, 3207-3219 (1983).
-
(1983)
Appl. Opt.
, vol.22
, pp. 3207-3219
-
-
Elson, J.M.1
Rahn, J.P.2
Bennett, J.M.3
-
8
-
-
0005361661
-
Effects of surface scatter on the optical performance of x-ray synchrotron beamline mirrors
-
J. E. Harvey, K. L. Lewotsky, and A. Kotha, "Effects of surface scatter on the optical performance of x-ray synchrotron beamline mirrors," Appl. Opt. 34, 3024-3032 (1995).
-
(1995)
Appl. Opt.
, vol.34
, pp. 3024-3032
-
-
Harvey, J.E.1
Lewotsky, K.L.2
Kotha, A.3
-
9
-
-
0032654749
-
Scattering and flare of 10 × projection cameras for EUV lithography
-
E. M. Gullikson, S. Baker, J. E. Bjorkholm, J. Bokor, K. A. Goldberg, J. E. M. Goldsmith, C. Montcalm, P. Naulleau, E. A. Spiller, D. G. Stearns, J. S. Taylor, and J. H. Underwood, "Scattering and flare of 10 × projection cameras for EUV lithography," Proc. SPIE 3676, 717-723 (1999).
-
(1999)
Proc. SPIE
, vol.3676
, pp. 717-723
-
-
Gullikson, E.M.1
Baker, S.2
Bjorkholm, J.E.3
Bokor, J.4
Goldberg, K.A.5
Goldsmith, J.E.M.6
Montcalm, C.7
Naulleau, P.8
Spiller, E.A.9
Stearns, D.G.10
Taylor, J.S.11
Underwood, J.H.12
-
10
-
-
0032402999
-
The fabrication and testing of optics for EUV projection lithography
-
J. S. Taylor, G. E. Sommargren, E. Gary, D. W. Sweeney, and R. M. Hudyma, "The fabrication and testing of optics for EUV projection lithography," Proc. SPIE 3331, 580-590 (1998).
-
(1998)
Proc. SPIE
, vol.3331
, pp. 580-590
-
-
Taylor, J.S.1
Sommargren, G.E.2
Gary, E.3
Sweeney, D.W.4
Hudyma, R.M.5
-
12
-
-
0001701356
-
Goniometric optical scatter instrument for out-of-plane ellipsometry measurements
-
T. A. Germer and C. C. Asmail, "Goniometric optical scatter instrument for out-of-plane ellipsometry measurements," Rev. Sci. Instrum. 70, 3688-3695 (1999).
-
(1999)
Rev. Sci. Instrum.
, vol.70
, pp. 3688-3695
-
-
Germer, T.A.1
Asmail, C.C.2
-
13
-
-
33244488732
-
Sensitive and flexible light scatter techniques from the VUV to IR regions
-
S. Schröder, S. Gliech, and A. Duparré, "Sensitive and flexible light scatter techniques from the VUV to IR regions," Proc.SPIE 5965, 424-432 (2005).
-
(2005)
Proc.SPIE
, vol.5965
, pp. 424-432
-
-
Schröder, S.1
Gliech, S.2
Duparré, A.3
-
14
-
-
21244491575
-
Angle-resolved ellipsometry of scattering patterns from arbitrary surfaces and bulks
-
O. Gilbert, C. Deumié, and C. Amra, "Angle-resolved ellipsometry of scattering patterns from arbitrary surfaces and bulks," Opt. Express 13, 2403-2418 (2005).
-
(2005)
Opt. Express
, vol.13
, pp. 2403-2418
-
-
Gilbert, O.1
Deumié, C.2
Amra, C.3
-
15
-
-
35648988908
-
Metrology capabilities and performance of the new DUV scatterometer of the PTB
-
M. Wurm, B. Bodermann, and F. Pilarski, "Metrology capabilities and performance of the new DUV scatterometer of the PTB," Proc. SPIE 6533, 65330H (2007).
-
(2007)
Proc. SPIE
, vol.6533
-
-
Wurm, M.1
Bodermann, B.2
Pilarski, F.3
-
16
-
-
0033072644
-
Comparative study of the roughness of optical surfaces and thin films by use of x-ray scattering and atomic force microscopy
-
V. E. Asadchikov, A. Duparré, S. Jakobs, A. Y. Karabekov, I. V. Kozhevnikov, and Y. S. Krivonosov, "Comparative study of the roughness of optical surfaces and thin films by use of x-ray scattering and atomic force microscopy," Appl. Opt. 38, 684-691 (1999).
-
(1999)
Appl. Opt.
, vol.38
, pp. 684-691
-
-
Asadchikov, V.E.1
Duparré, A.2
Jakobs, S.3
Karabekov, A.Y.4
Kozhevnikov, I.V.5
Krivonosov, Y.S.6
-
17
-
-
0141501387
-
Characterization of the PTB EUV reflectometry facility for large EUVL optical components
-
J. Tummler, H. Blume, G. Brandt, J. Eden, B. Meyer, H. Scherr, F. Scholz, F. Scholze, and G. Ulm, "Characterization of the PTB EUV reflectometry facility for large EUVL optical components," Proc. SPIE 5037, 265 (2003).
-
(2003)
Proc. SPIE
, vol.5037
, pp. 265
-
-
Tummler, J.1
Blume, H.2
Brandt, G.3
Eden, J.4
Meyer, B.5
Scherr, H.6
Scholz, F.7
Scholze, F.8
Ulm, G.9
-
18
-
-
34648812832
-
Direct evaluation of surface roughness of substrate and interfacial roughness in molybdenum/silicon multilayers using extreme ultraviolet reflectometer
-
M. Hosoya, N. Sakaya, O. Nozawa, Y. Shiota, S. Shimojima, T. Shoki, T. Watanabe, and H. Kinoshita, "Direct evaluation of surface roughness of substrate and interfacial roughness in molybdenum/silicon multilayers using extreme ultraviolet reflectometer," Jpn. J. Appl. Phys. 46, 6128-6134 (2007).
-
(2007)
Jpn. J. Appl. Phys.
, vol.46
, pp. 6128-6134
-
-
Hosoya, M.1
Sakaya, N.2
Nozawa, O.3
Shiota, Y.4
Shimojima, S.5
Shoki, T.6
Watanabe, T.7
Kinoshita, H.8
-
19
-
-
3843119801
-
High-throughput EUV reflectometer for EUV mask blanks
-
R. Lebert, C. Wies, L. Juschkin, B. Jaegle, M. Meisen, L. Aschke, F. Sobel, H. Seitz, F. Scholze, G. Ulm, K. Walter, W. Neff, K. Bergmann, and W. Biel, "High-throughput EUV reflectometer for EUV mask blanks," Proc. SPIE 5374, 808-817 (2004).
-
(2004)
Proc. SPIE
, vol.5374
, pp. 808-817
-
-
Lebert, R.1
Wies, C.2
Juschkin, L.3
Jaegle, B.4
Meisen, M.5
Aschke, L.6
Sobel, F.7
Seitz, H.8
Scholze, F.9
Ulm, G.10
Walter, K.11
Neff, W.12
Bergmann, K.13
Biel, W.14
-
20
-
-
33750588325
-
Novel compact spectrophotometer for EUV-optics characterization
-
K. Starke, H. Blaschke, L. Jensen, S. Nevas, D. Ristau, R. Lebert, C. Wies, A. Bayer, F. Barkusky, and K. Mann, "Novel compact spectrophotometer for EUV-optics characterization," Proc. SPIE 6317, 631701 (2006).
-
(2006)
Proc. SPIE
, vol.6317
, pp. 631701
-
-
Starke, K.1
Blaschke, H.2
Jensen, L.3
Nevas, S.4
Ristau, D.5
Lebert, R.6
Wies, C.7
Bayer, A.8
Barkusky, F.9
Mann, K.10
-
21
-
-
33947696725
-
Characterization of the measurement uncertainty of a laboratory EUV reflectometer for large optics
-
F. Scholze, T. Böttger, H. Enkisch, C. Laubis, L. van Loyen, F. Macco, and S. Schädlich, "Characterization of the measurement uncertainty of a laboratory EUV reflectometer for large optics," Meas. Sci. Technol. 18, 126-130 (2007).
-
(2007)
Meas. Sci. Technol.
, vol.18
, pp. 126-130
-
-
Scholze, F.1
Böttger, T.2
Enkisch, H.3
Laubis, C.4
Van Loyen, L.5
MacCo, F.6
Schädlich, S.7
-
24
-
-
84911475667
-
Scattering from surfaces and thin films
-
B. Guenther and D. Steel, eds. (Elsevier)
-
A. Duparré, "Scattering from Surfaces and Thin Films," in Encyclopedia of Modern Optics, B. Guenther and D. Steel, eds. (Elsevier, 2004), pp. 314-321.
-
(2004)
Encyclopedia of Modern Optics
, pp. 314-321
-
-
Duparré, A.1
-
25
-
-
3843129573
-
Status of the EUV-lamp development and demonstration of applications
-
R. Lebert, C. Wies, B. Jägle, L. Juschkin, U. Bieberle, M. Meisen, W. Neff, K. Bergmann, K. Walter, O. Rosier, M. C. Schuermann, and T. Missalla, "Status of the EUV-lamp development and demonstration of applications," Proc. SPIE 5374, 943-953 (2004).
-
(2004)
Proc. SPIE
, vol.5374
, pp. 943-953
-
-
Lebert, R.1
Wies, C.2
Jägle, B.3
Juschkin, L.4
Bieberle, U.5
Meisen, M.6
Neff, W.7
Bergmann, K.8
Walter, K.9
Rosier, O.10
Schuermann, M.C.11
Missalla, T.12
-
27
-
-
51949115827
-
EUV-induced oxidation of Mo/Simultilayers
-
N. Benoit, S. Schröder, S. Yulin, T. Feigl, A. Duparré, N. Kaiser, and A. Tünnermann, "EUV-induced oxidation of Mo/Simultilayers," Appl. Opt. 47, 3455-3462 (2008).
-
(2008)
Appl. Opt.
, vol.47
, pp. 3455-3462
-
-
Benoit, N.1
Schröder, S.2
Yulin, S.3
Feigl, T.4
Duparré, A.5
Kaiser, N.6
Tünnermann, A.7
-
29
-
-
0037226192
-
Present status of radiometric quality silicon photodiodes
-
R. Korde, C. Prince, D. Cunningham, R. E. Vest, and E. Gullikson, "Present status of radiometric quality silicon photodiodes," Metrologia 40, S145-S149 (2003).
-
(2003)
Metrologia
, vol.40
-
-
Korde, R.1
Prince, C.2
Cunningham, D.3
Vest, R.E.4
Gullikson, E.5
-
30
-
-
0037226007
-
High-accuracy radiometry in the EUV range at the PTB soft x-ray radiometry beamline
-
F. Scholze, J. Tümmler, and G. Ulm, "High-accuracy radiometry in the EUV range at the PTB soft x-ray radiometry beamline," Metrologia 40, S224-S228 (2003).
-
(2003)
Metrologia
, vol.40
-
-
Scholze, F.1
Tümmler, J.2
Ulm, G.3
-
31
-
-
77949804977
-
-
Tech. Rep. Proposal 2003C002 (KEK, Japan)
-
N. Kandaka, T. Kobayashi, M. Shiraishi, T. Komiya, T. Oshino, and K. Murakami, "Measurement of EUV scattering from Mo/Si multilayer mirrors," Tech. Rep. Proposal 2003C002 (KEK, Japan, 2003).
-
(2003)
Measurement of EUV Scattering from Mo/Si Multilayer Mirrors
-
-
Kandaka, N.1
Kobayashi, T.2
Shiraishi, M.3
Komiya, T.4
Oshino, T.5
Murakami, K.6
-
34
-
-
0041762537
-
Effects of interface roughness on the spectral properties of thin films and multilayers
-
A. V. Tikhonravov, M. K. Trubetskov, A. A. Tikhonravov, and A. Duparre, "Effects of interface roughness on the spectral properties of thin films and multilayers," Appl. Opt. 42, 5140-5148 (2003).
-
(2003)
Appl. Opt.
, vol.42
, pp. 5140-5148
-
-
Tikhonravov, A.V.1
Trubetskov, M.K.2
Tikhonravov, A.A.3
Duparre, A.4
-
35
-
-
0018441882
-
Scalar scattering theory for multiayer optical coatings
-
C. K. Carniglia, "Scalar scattering theory for multiayer optical coatings," Opt. Eng. 18, 104-115 (1979).
-
(1979)
Opt. Eng.
, vol.18
, pp. 104-115
-
-
Carniglia, C.K.1
-
36
-
-
0000515073
-
Caracterisation des surface par reflexion rasante de rayons X. Application a l'etude du polissage de quelques verres silicates
-
L. Névot and P. Croce, "Caracterisation des surface par reflexion rasante de rayons X. Application a l'etude du polissage de quelques verres silicates," Rev. Phys. Appl. 15, 761-779 (1980).
-
(1980)
Rev. Phys. Appl.
, vol.15
, pp. 761-779
-
-
Névot, L.1
Croce, P.2
-
37
-
-
56249127529
-
Nonspecular x-ray scattering in a multilayer coated imaging system
-
D. G. Stearns, D. P. Gaines, D. W. Sweeney, and E. M. Gullikson, "Nonspecular x-ray scattering in a multilayer coated imaging system," J. Appl. Phys. 84, 1003-1028 (1998).
-
(1998)
J. Appl. Phys.
, vol.84
, pp. 1003-1028
-
-
Stearns, D.G.1
Gaines, D.P.2
Sweeney, D.W.3
Gullikson, E.M.4
-
38
-
-
0019612893
-
Scattering from multilayer thin films: Theory and experiment
-
P. Bousquet, F. Flory, and P. Roche, "Scattering from multilayer thin films: theory and experiment," J. Opt. Soc. Am. 71, 1115-1123 (1981).
-
(1981)
J. Opt. Soc. Am.
, vol.71
, pp. 1115-1123
-
-
Bousquet, P.1
Flory, F.2
Roche, P.3
-
39
-
-
0005997281
-
Roughness and light scattering of ion-beam-sputtered fluoride coatings for 193 nm
-
J. Ferré-Borrull, A. Duparré, and E. Quesnel, "Roughness and light scattering of ion-beam-sputtered fluoride coatings for 193 nm," Appl. Opt. 39, 5854-5864 (2000).
-
(2000)
Appl. Opt.
, vol.39
, pp. 5854-5864
-
-
Ferré-Borrull, J.1
Duparré, A.2
Quesnel, E.3
-
40
-
-
0001634592
-
IMD-software for modelling the optical properties of multilayer films
-
D. L. Windt, "IMD-software for modelling the optical properties of multilayer films," Comput. Phys. 12, 360-370 (1998).
-
(1998)
Comput. Phys.
, vol.12
, pp. 360-370
-
-
Windt, D.L.1
-
41
-
-
0004932883
-
X-ray interactions: Photoabsorption, scattering, transmission, andreflection atE = 50-30000 eV, Z = 1-92
-
B. L. Henke, E. M. Gullikson, and J. C. Davis, "X-ray interactions: photoabsorption, scattering, transmission,andreflection atE = 50-30000 eV, Z = 1-92," At. Data Nucl. Data Tables 54, 181-342 (1993), http://henke.lbl.gov/ optical-constants.
-
(1993)
At. Data Nucl. Data Tables
, vol.54
, pp. 181-342
-
-
Henke, B.L.1
Gullikson, E.M.2
Davis, J.C.3
-
43
-
-
0036285061
-
Surface characterization techniques for determining rms roughness and power spectral densities of optical components
-
A. Duparré, J. Ferré-Borrull, S. Gliech, G. Notni, J. Steinert, and J. M. Bennett, "Surface characterization techniques for determining rms roughness and power spectral densities of optical components," Appl. Opt. 41, 154-171 (2002).
-
(2002)
Appl. Opt.
, vol.41
, pp. 154-171
-
-
Duparré, A.1
Ferré-Borrull, J.2
Gliech, S.3
Notni, G.4
Steinert, J.5
Bennett, J.M.6
-
45
-
-
35348993828
-
EUV reflectance and scattering of Mo/Si multilayers on differently polished substrates
-
S. Schröder, T. Feigl, A. Duparré, and A. Tünnermann, "EUV reflectance and scattering of Mo/Si multilayers on differently polished substrates," Opt. Express 15, 13997-14012 (2007).
-
(2007)
Opt. Express
, vol.15
, pp. 13997-14012
-
-
Schröder, S.1
Feigl, T.2
Duparré, A.3
Tünnermann, A.4
|