Extreme-ultraviolet-induced oxidation of Mo/Si multilayers

Applied Optics

Volumn 47, Issue 19, 2008, Pages 3455-3462

  Benoit, Nicolas ^a,b   Schröder, Sven ^a,c   Nn, Sergiy Yu ^a   Feigl, Torsten ^a   Duparré, Angela ^a   Kaiser, Norbert ^a   Tünnermann, Andreas ^a,c  

^a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

^b CARL ZEISS SMT AG   (Germany)

^c FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; EXTREME ULTRAVIOLET LITHOGRAPHY; MIRRORS; MOLYBDENUM; MULTILAYERS; OXIDATION; REFLECTION;

EUV REFLECTIVITY; EXTREME ULTRAVIOLET; EXTREME ULTRAVIOLETS; INDUCED OXIDATIONS; MO/SI MULTILAYER; OXIDATION MODEL; SCATTERING MEASUREMENTS; SMALL ANGLE X-RAYS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 51949115827     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.47.003455     Document Type: Article

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