Surface characterization techniques for determining the root-mean-square roughness and power spectral densities of optical components

Applied Optics

Volumn 41, Issue 1, 2002, Pages 154-171

  Duparré, Angela ^a   Ferre, Josep ^a   Ferre Borrull, Josep ^a,b   Gliech, Stefan ^a   Notni, Gunther ^a   Steinert, Jörg ^a   Bennett, Jean M ^c  

^a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

^b UNIVERSITY OF BARCELONA   (Spain)

^c NAVAL AIR WARFARE CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; LIGHT SCATTERING; OPTICAL PROPERTIES; SAPPHIRE; SCANNING; SILICA; SILICON CARBIDE;

OPTICAL COMPONENTS; POWER SPECTRAL DENSITY (PSD);

SURFACE ROUGHNESS;

EID: 0036285061     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.41.000154     Document Type: Article

References (56)

1. J. M. Bennett and L. Mattsson, Introduction to Surface Roughness and Scattering, 2nd ed. (Optical Society of America, Washington, D.C., 1999), Chap. 3 and references therein.
2. Standard Test Method for Measuring the Effective Surface Roughness of Optical Components by Total Integrated Scattering, ASTM Doc. F1048-87 (American Society for Testing and Materials, Philadelphia, Pa., 1987).
3. J. A. Detrio and S. M. Miner, “Standardized total integrated scatter measurements of optical surfaces, ” Opt. Eng. 24, 419 -422 (1985).
4. Standard Practice for Angle Resolved Optical Scatter Measurements on Specular or Diffuse Surfaces, ASTM Doc. E1392-90 (American Society for Testing and Materials, Philadelphia, Pa., 1990).
5. T. A. Leonard and M. Pantoliano, “BRDF round robin, ” in Stray Light and Contamination in Optical Systems, R. P. Breault, ed., Proc. SPIE 967, 226-235 (1989).
6. T. A. Leonard, “Standardization of optical scatter measurements, ” in Stray Radiation in Optical Systems, R. P. Breault, ed., Proc. SPIE 1331, 188-194 (1990).
7. P. Kadkhoda, A. Muller, D. Ristau, A. Duparre, S. Gliech, H. Lauth, U. Schuhmann, N. Reng, M. Tilsch, R. Schuhmann, C. Amra, C. Deumie, C. Jolie, H. Kessler, T. Lindstrom, C.-G. Ribbing, and J. M. Bennett, “International round-robin experiment to test the International Organization for Standardization total-scattering draft standard, ” Appl. Opt. 39, 3321-3332 (2000).
8. J. C. Stover, ed., Optical Scattering: Measurement and Analysis, 2nd ed., Vol. PM24 of the Press Monographs (SPIE, Bellingham, Wash., 1995).
9. E. L. Church and P. Z. Takacs, “The optimal estimation of finish parameters, ” in Optical Scatter: Applications, Measurement, and Theory, J. C. Stover, ed., Proc. SPIE 1530, 71-78 (1991).
10. J. M. Elson, J. M. Bennett, and J. C. Stover, “Wavelength and angular dependence of light scattering from beryllium: comparison of theory and experiment, ” Appl. Opt. 32, 3362-3376 (1993).
11. E. L. Church, “Fractal surface finish, ” Appl. Opt. 27, 1518-1526 (1988).
12. E. Marx, I. J. Malik, Y. E. Strausser, T. Bristow, N. Poduje, and J. C. Stover, “Round robin determination of power spectral densities of different Si wafer surfaces, ” in Flatness, Roughness, and Discrete Defects Characterization for Computer Disks, Wafers, and Flat Panel Displays II, J. C. Stover, ed., Proc. SPIE 3275, 26-36 (1998).
13. E. Marx, I. J. Malik, Y. E. Strausser, T. Bristow, N. Poduje, and J. C. Stover, “Power spectral densities: a multiple technique study of different Si wafer surfaces, ” J. Vac. Sci. Technol. 20 (Jan./Feb. 2002) (to be published).
14. T. Abe, E. F. Steigmeier, W. Hagleitner, and A. J. Pidduck, “Microroughness measurements on polished silicon wafers, ” Jpn. J. Appl. Phys. 31, Part 1, 721-728 (1992).
15. D. Duparre and S. Jakobs, “Combination of surface characterization techniques for investigating optical thin-film components, ” Appl. Opt. 35, 5052-5058 (1996).
16. D. Duparre and G. Notni, “Multi-type surface and thin film characterization using light scattering, scanning-force microscopy and white light interferometry, ” in Optical Metrology, G. A. Al-Jumaily, ed., Vol. CR72 of SPIE Critical Reviews of Optical Science and Technology (SPIE, Bellingham, Wash., 1999), pp. 213-231.
17. R. D. Jacobson, S. R. Wilson, G. A. Al-Jumaily, J. R. McNeil, J. M. Bennett, and L. Mattsson, “Microstructure characterization by angle-resolved scatter and comparison to measurements made by other techniques, ” Appl. Opt. 31, 1426-1435 (1992).
18. G. Nomarski, “Microinterferometre differentiel a ondes polarisées, ” J. Phys. Radium 16, 9S-13S (1955).
19. G. Nomarski and A. R. Weill, “Application a la metallographie des methodes interferentielles a deux ondes polarisées, ” Rev. Metall. (Paris) 52, 121-134 (1955).
20. R. Young, J. Ward, and F. Scire, “The Topografiner: an instrument for measuring surface microtopography, ” Rev. Sci. Instrum. 43, 999-1011 (1972).
21. G. Binnig and H. Rohrer, “Scanning tunneling microscopy, ” Helv. Phys. Acta 55, 726-735 (1982).
22. G. Binnig, H. Rohrer, Ch. Gerber, and E. Weibel, “Surface studies by scanning tunneling microscopy, ” Phys. Rev. Lett. 49, 57-61 (1982).
23. G. Binnig, C. F. Quate, and Ch. Gerber, “Atomic force microscope, ” Phys. Rev. Lett. 56, 930-933 (1986).
24. D. Sarid, Scanning Force Microscopy with Applications to Electric, Magnetic, and Atomic Forces (Oxford U. Press, New York, 1991).
25. S. N. Magonov and M.-H. Whangbo, Surface Analysis with STM and SFM (VCH, Weinheim, Germany, 1995).
26. Digital Instruments, a division of Veeco Process Metrology, 112 Robin Hill Road, Goleta, Calif. 93117; http://www.di.com.
27. A. Duparre, C. Ruppe, K. A. Pischow, M. Adamik, and P. B. Barna, “Atomic force microscopy on cross-sections of optical coatings: a new method, ” Thin Solid Films 261, 70-75 (1995).
28. C. Ruppe and A. Duparre, “Roughness analysis of optical films and substrates by atomic force microscopy, ” Thin Solid Films 288, 8-13 (1996).
29. Taylor Hobson Limited, P.O. Box 36, 2 New Star Road, Leicester LE4 7JQ UK (U.S. address: 2100 Golf Road, Suite 350, Rolling Meadows, Ill. 60008-4231).
30. J. M. Bennett and J. H. Dancy, “Stylus profiling instrument for measuring statistical properties of smooth optical surfaces, ” Appl. Opt. 20, 1785-1802 (1981).
31. M. Davidson, K. Kaufman, I. Mazor, and F. Cohen, “An application of interference microscopy to integrated circuit inspection and metrology, ” in Integrated Circuit Metrology, Inspection, and Process Control, K. M. Monahan, ed., Proc. SPIE 775, 233-247 (1987).
32. G. S. Kino and S. Chim, “Mirau correlation microscope, ” Appl. Opt. 29, 3775-3783 (1990).
33. B. S. Lee and T. C. Strand, “Profilometry with a coherence scanning microscope, ” Appl. Opt. 29, 3784-3788 (1990).
34. R.-J. Recknagel and G. Notni, “Measurement and analysis of microtopography using wavelet methods, ” in Optical Inspection and Micromeasurements II, C. Gorecki, ed., Proc. SPIE 3098, 133-143 (1997).
35. R.-J. Recknagel and G. Notni, “Analysis of white light inter-ferograms using wavelet methods, ” Opt. Commun. 148, 122-128 (1998).
36. J. R. Sheppard, “Scanning optical microscopy, ” in Advances in Optical and Electron Microscopy, R. Barer and V. E. Coss-lett, eds. (Academic, London, 1987), Vol. 10, Chap. 1, pp. 1-98.
37. T. Wilson, “Optical aspects of confocal microscopy, ” in Confocal Microscopy, T. Wilson, ed. (Academic, London, 1990), Chap. 3.
38. N. J. McCormick, “Confocal scanning optical microscopy, ” in Surface Characterization, A User’s Sourcebook, D. Brune, R. Hellborg, H. J. Whitlow, and O. Hunderi, eds. (Wiley-VCH, Weinheim, Germany, 1997), pp. 57-76.
39. Carl Zeiss Jena GmbH, Carl-Zeiss Promenade 1a, D-07745 Jena, Germany; http://www.zeiss.de.
40. J. Neubert, T. Seifert, N. Czarnetzki, and T. Weigel, “Fully automated angle resolved scatterometer, ” in Space Optics 1994: Space Instrumentation and Spacecraft Optics, T. M. Dewandre, J. J. Schulte-in-den-Baeumen, and E. Sein, eds., Proc. SPIE 2210, 543-552 (1994).
41. A. Duparre, S. Gliech, and J. Steinert, “Light scattering of UV-optical components, ” in Proceedings of the Fifth International Workshop on Laser Beam and Optics Characterization, (LBOC 5) (VDI Technologiezentrum, Dusseldorf, Germany, 2000), pp. 272-282.
42. Optics and Optical Instruments—Lasers and Laser-Related Equipment—Test Methods for Radiation Scattered by Optical Components, ISO/FDIS 13696, Technical Committee ISO/TC 172/SC9/WG6, Final Draft Standard (International Organization for Standardization, Geneva, Switzerland, 1998).
43. D. Ronnow and E. Veszelei, “Design review of an instrument for spectroscopic total integrated light scattering measurements in the visible wavelength region, ” Rev. Sci. Instrum. 65, 327-334 (1994).
44. A. Duparre and S. Gliech, “Quality assessment from supersmooth to rough surfaces by multiple wavelength light scattering measurement, ” in Scattering and Surface Roughness, Z. Gu and A. A. Maradudin, eds., Proc. SPIE 3141, 57-64 (1997).
45. S. Gliech, J. Steinert, M. Flemming, and A. Duparre, “DUV/ VUV light scattering measurement of optical components for lithography applications, ” in Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, G. A. Al-Jumarily, A. Duparre, and B. Singh, eds., Proc. SPIE 4099, 74-81 (2000).
46. We used 99% reflectance Spectralon, Labsphere Inc., subsidiary of X-Rite, Inc., P.O. Box 70, North Sutton, N.H. 032600070; http://www.labsphere.com.
47. J. M. Elson and J. M. Bennett, “Calculation of the power spectral density from surface profile data, ” Appl. Opt. 34, 201-208 (1995).
48. E. L. Church and P. Z. Takacs, “BASIC program for power spectrum estimation, ” Informal Rep. 490.35 (Brookhaven National Laboratory, Upton, N.Y., 1993).
49. J. Ferre-Borrull, J. Steinert, and A. Duparre, “Extending the capabilities of scanning probe microscopy for microroughness analysis in surface engineering, ” Surf. Interface Anal. 29, SpecialIssue: Papers Presented at the Fourth International Conference on the Development and Technological Application of Scanning Probe Methods 33 (2002) (to be published).
50. J. M. Elson and J. M. Bennett, “Vector scattering theory, ” Opt. Eng. 18, 116-124 (1979).
51. E. L. Church, H. A. Jenkinson, and J. M. Zavada, “Relationship between surface scattering and microtopographic features, ” Opt. Eng. 18, 125-136 (1979).
52. P. Bousquet, F. Flory, and P. Roche, “Scattering from multilayer films: theory and experiment, ” J. Opt. Soc. Am. 71, 1115-1123 (1981).
53. W. H. Press, B. P. Flannery, S. A. Teukolsky, and W. T. Vet-terling, Numerical Recipes in C (Cambridge U. Press, Cambridge, UK, 1990).
54. O. Kienzle, V. Scheuer, J. Staub, and T. Tschudi, “Design of an integrated scatter instrument for measuring scatter losses of superpolished optical surfaces, application to surface characterization of transparent fused quartz substrates, ” in Optical Interference Coatings, F. Abeies, ed., Proc. SPIE 2253, 1131-1142 (1994).
55. J. M. Bennett, “Surface roughness measurement, ” in Optical Measurement Techniques and Applications, P. K. Rastogi, ed. (Artech House, Norwood, Mass., 1997), Chap. 12, pp. 341-367.
56. J. M. Bennett, J. Jahanmir, J. C. Podlesny, T. L. Balter, and D. T. Hobbs, “Scanning force microscope as a tool for studying optical surfaces, ” Appl. Opt. 34, 213-230 (1995).