EUV reflectance and scattering of Mo/Si multilayers on differently polished substrates

Optics Express

Volumn 15, Issue 21, 2007, Pages 13997-14012

  Schröder, Sven ^a,b   Feigl, Torsten ^b   Duparré, Angela ^b   Tünnermann, Andreas ^a,b  

^a FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

^b FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTROMAGNETIC WAVE REFLECTION; ELECTROMAGNETIC WAVE SCATTERING; MOLYBDENUM; SILICON; SIZE DETERMINATION;

ROUGHNESS ANALYSIS; SIZE MEASUREMENT SYSTEMS;

MULTILAYERS;

EID: 35348993828     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.15.013997     Document Type: Article

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