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Volumn 6317, Issue , 2006, Pages

Novel compact spectrophotometer for EUV-optics characterization

Author keywords

Compact EUV spectrophotometer; EUV optics metrology; EUV reflectometer

Indexed keywords

OPTICAL PROPERTIES; RADIATION EFFECTS; REFLECTION; SYNCHROTRON RADIATION;

EID: 33750588325     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.686878     Document Type: Conference Paper
Times cited : (4)

References (8)
  • 1
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    • Soft x-ray reflectometer of multilayer coatings using a laser-plasma source
    • D. L. Windt, W. K. Waskiewicz, "Soft x-ray reflectometer of multilayer coatings using a laser-plasma source", Proc. SPIE 1547, 144-158 (1991).
    • (1991) Proc. SPIE , vol.1547 , pp. 144-158
    • Windt, D.L.1    Waskiewicz, W.K.2
  • 2
    • 0001412925 scopus 로고
    • A soft x-ray/EUV reflectometer based on a laser-plasma source
    • E. M. Gullikson, J. H. Underwood, et al., "A soft x-ray/EUV reflectometer based on a laser-plasma source", J. X-Ray Sci. Technol. 3, 283-299 (1992).
    • (1992) J. X-ray Sci. Technol. , vol.3 , pp. 283-299
    • Gullikson, E.M.1    Underwood, J.H.2
  • 3
    • 0141835808 scopus 로고    scopus 로고
    • A new laboratory EUV reflectometer for large optics using a laser plasma source
    • Metrology, Inspection, and Process Control for Microlithography XVII
    • L. van Loyen, et al., "A new laboratory EUV reflectometer for large optics using a laser plasma source", Metrology, Inspection, and Process Control for Microlithography XVII, Proc. SPIE 5038, 12-20 (2003).
    • (2003) Proc. SPIE , vol.5038 , pp. 12-20
    • Van Loyen, L.1
  • 4
    • 0033697560 scopus 로고    scopus 로고
    • A laser produced plasma based reflectometer for EUV metrology
    • Emerging Lithographic Technologies IV
    • S. Mrowka, J. H. Underwood, E. M. Gullikson, P. J. Batson, "A laser produced plasma based reflectometer for EUV metrology", Emerging Lithographic Technologies IV, Proc. SPIE 3997, 819-822 (2000).
    • (2000) Proc. SPIE , vol.3997 , pp. 819-822
    • Mrowka, S.1    Underwood, J.H.2    Gullikson, E.M.3    Batson, P.J.4
  • 6
    • 11844280362 scopus 로고    scopus 로고
    • Compact electron-based EUV source for at-wavelength metrology
    • High Power Laser Ablation V
    • A. Egbert; B. Tkachenko; S. Becker; B. N. Chichkov "Compact electron-based EUV source for at-wavelength metrology", High Power Laser Ablation V, Proc. SPIE 5448 1, 693-703 (2004).
    • (2004) Proc. SPIE , vol.5448 , Issue.1 , pp. 693-703
    • Egbert, A.1    Tkachenko, B.2    Becker, S.3    Chichkov, B.N.4
  • 8
    • 33750596845 scopus 로고    scopus 로고
    • Center of X-ray Optics, Lawrence Berkeley National Laboratory: http://www-cxro.lbl.gov/optical_constants/


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.