SCOPUS 정보 검색 플랫폼 - 논문 보기

메뉴 건너뛰기

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3331, Issue , 1998, Pages 580-590

The fabrication and testing of optics for EUV projection lithography

(4) Taylor, John S a Sommargren, Gary E a Sweeney, Donald W a Hudyma, Russell M a

a LAWRENCE LIVERMORE NATIONAL LABORATORY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGING SYSTEMS; MICROELECTRONICS; SUBSTRATES; ULTRAVIOLET RADIATION;

OPTICAL PRINTING;

PHOTOLITHOGRAPHY;

EID: 0032402999 PISSN: 0277786X EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.309619 Document Type: Conference Paper

Times cited : (50)

References (32)

1
- 0003205788
- Trends in Optics and Photonics (TOPS), Optical Society of America
- (1996) Extreme Ultraviolet Lithography , vol.4
- Kubiak, G.D.¹ Kania, D.R.²

2
- 0031169521
- EUV lithography
- Summer
- (1997) Microlithography World , vol.6 , Issue.3 , pp. 17
- Hawryluk, A.M.¹ Ceglio, N.M.² Markle, D.A.³

3
- 0002233727
- Recent advances in the Sandia 5x microstepper
- Proc. SPIE, paper 3331-02 to be published; this proceedings
- (1998) Emerging Lithographic Technologies II , vol.3331
- Goldsmith, J.E.M.¹

4
- 0003009256
- EUV optical design for a 0.1 μm imaging system
- Proc. SPIE, paper 3331-01 to be published; this proceedings
- (1998) Emerging Lithographic Technologies II , vol.3331
- Sweeney, D.W.¹

5
- 0010406266
- note

6
- 85076473652
- Scattered light in photolithographic lenses
- Proc. SPIE
- (1994) Optical/Laser Microlithography VII , vol.2197 , pp. 566-572
- Kirk, J.P.¹

7
- 0031364439
- Measuring flare and its effect on process latitude
- Proc. SPIE
- (1997) Optical Microlithography X , vol.3051 , pp. 708-723
- Park, J.¹

8
- 0031359309
- Potential causes of across-field CD variation
- Proc. SPIE
- (1997) Optical Microlithography X , vol.3051 , pp. 660-671
- Progler, C.¹ Du, H.² Wells, G.³

9
- 0002407420
- Multilayer reflective coatings for extreme-ultraviolet lithography
- Proc. SPIE, paper 3331-05 to be published; this proceedings
- (1998) Emerging Lithographic Technologies II , vol.3331
- Montcalm, C.¹

10
- 0028421881
- Surface finish requirements for soft x-ray mirrors
- 1 April
- (1994) Applied Optics , vol.33 , Issue.10 , pp. 2025-2031
- Windt, D.L.¹ Waskiewicz, W.K.² Griffith, J.E.³

11
- 0010368842
- note

12
- 0010366481
- Progress in the development of EUV imaging systems
- Trends in Optics and Photonics (TOPS), G. D. Kubiak and D. R. Kania eds., Optical Society of America
- (1996) Extreme Ultraviolet Lithography , vol.4 , pp. 2-8
- Tichenor, D.A.¹

13
- 0010406267
- Surface characterization of optics for EUV lithography
- Trends in Optics and Photonics (TOPS), G. D. Kubiak and D. R. Kania eds., Optical Society of America
- (1996) Extreme Ultraviolet Lithography , vol.4 , pp. 103-106
- Gaines, D.P.¹

14
- 0010402850
- Precision asphere fabrication and metrology to tolerances <1 nm rms
- Boston, May 1-3
- (1996) OSA Optical Fabrication and Testing Topical Meeting
- Kestner, R.¹

15
- 0022864698
- Preparation of ultrasmooth surfaces
- (1986) Ann. Rev. Mater. Sci. , vol.16 , pp. 371-388
- Brown, N.J.¹

16
- 0010320171
- Computer controlled fabrication of microlithographic aspheres
- October 27-29, Mt. Fuji, Japan
- (1993) US-Japan Workshop on EUV Lithography
- Bajuk, D.¹

17
- 0029516243
- Combining ion figuring and SPSI testing to produce a high quality, aspheric, 18″ diameter, f/2 mirror
- Proc. SPIE
- (1995) Optical Manufacturing and Testing , vol.2536 , pp. 89-98
- Carbone, F.A.¹ Markle, D.²

18
- 0010365332
- SVG litho, NASA enter optical collaboration
- vol. 4.9, March 10
- (1997) Wafer News

19
- 0030284208
- Precision optical aspheres for extreme ultraviolet lithography
- Nov./Dec.
- (1996) J. Vac. Sci. & Tech. , vol.14 , Issue.6 , pp. 3706-3708
- Kania, D.R.¹

20
- 0010358886
- Zerodur and Zerodur M are manufactured by Schott Glass Technologies, Inc.

21
- 0010366316
- ULE is manufactured by Corning, Inc.

22
- 0003366352
- Nonspecular scattering for normal-incidence EUV optics
- Proc. SPIE, paper 3331-08 to be published; this proceedings
- (1998) Emerging Lithographic Technologies II , vol.3331
- Gullikson, E.M.¹

23
- 0010319451
- SPIE Milestone Series
- (1991) Selected Papers on Computer-Controlled Optical Surfacing , vol.MS40
- Jones, R.A.¹

24
- 0029184354
- Calculation of the power spectral density from surface profile data
- 1 Jan
- (1995) Applied Optics , vol.34 , Issue.1 , pp. 201-208
- Elson, J.M.¹ Bennett, J.M.²

25
- 0010318511
- Specification of glancing- and normal-incidence x-ray mirrors
- Feb.
- (1995) Optical Engineering , vol.34 , Issue.2 , pp. 353-360
- Church, E.L.¹ Takacs, P.Z.²

26
- 0003882935
- published on behalf of the Commission of the European Communities by the Univ. of Birmingham, Great Britain, pub. No EUR 15178 EN, ISBN 0 7044 1313 2
- (1993) The Development of Methods for the Characterization of Roughness in Three Dimensions , pp. 187-193
- Stout, K.J.¹

27
- 0029493323
- Specification of optical components using the power spectral density function
- Proc. SPIE
- (1995) Optical Manufacturing and Testing , vol.2536 , pp. 38-50
- Lawson, J.K.¹

28
- 0010365803
- The software used is PSDMaker by D.G. Stearns, OS Associates, 1174 Castro St., Suite 250, Mountain View, CA 94040

29
- 0001501409
- Fractal surface finish
- 15 Apr
- (1988) Applied Optics , vol.27 , Issue.8 , pp. 1518-1526
- Church, E.L.¹

30
- 0003674201
- Addison Wesley, Menlo Park, CA
- (1970) College Calculus with Analytic Geometry
- Protter, M.H.¹ Morrey C.B., Jr.²

31
- 0000222824
- Phase shifting diffraction interferometry for measuring extreme ultraviolet optics
- Trends in Optics and Photonics (TOPS), G. D. Kubiak and D. R. Kania eds., Optical Society of America
- (1996) Extreme Ultraviolet Lithography , vol.4 , pp. 108-112
- Sommargren, G.E.¹

32
- 0010319838
- Measurement of aspheres using phase shifting diffraction interferometry
- October 20-24, Rochester, NY
- (1996) OSA Annual Meeting and Exhibit
- Campbell, G.¹ Sommargren, G.E.² Phillion, D.W.³

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.