Characterization of the measurement uncertainty of a laboratory EUV reflectometer for large optics

Measurement Science and Technology

Volumn 18, Issue 1, 2007, Pages 126-130

  Scholze, Frank ^a   Böttger, Thomas ^b   Enkisch, Hartmut ^c   Laubis, Christian ^a   Van Loyen, Ludwig ^d   MacCo, Fritz ^c   Schädlich, Stefan ^b  

^a PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

^b FRAUNHOFER INSTITUTE FOR MATERIAL AND BEAM TECHNOLOGY IWS   (Germany)

^c CARL ZEISS SMT AG   (Germany)

^d Europäische Forschungsgesellschaft Dünne Schichten E V   (Germany)

Author keywords

At wavelength characterization; Extreme ultraviolet; Lithography; Metrology; Reflectometry

Indexed keywords

LASER APPLICATIONS; LITHOGRAPHY; MIRRORS; REFLECTOMETERS; SYNCHROTRON RADIATION;

EXTREME ULTRAVIOLET; LASER PRODUCED PLASMA (LPP); REFLECTOMETRY;

ULTRAVIOLET RADIATION;

LASER APPLICATIONS; LITHOGRAPHY; MIRRORS; REFLECTOMETERS; SYNCHROTRON RADIATION; ULTRAVIOLET RADIATION;

EID: 33947696725     PISSN: 09570233     EISSN: 13616501     Source Type: Journal    
DOI: 10.1088/0957-0233/18/1/015     Document Type: Conference Paper

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