Optics developments in the VUV - Soft X-ray spectral region

Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment

Volumn 483, Issue 1-2, 2002, Pages 351-356

  Feigl, T ^a   Heber, J ^a   Gatto, A ^a   Kaiser, N ^a  

^a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

Author keywords

EUV; Microlithography; Multilayer optics; Soft X ray; VUV

Indexed keywords

FABRICATION; FREE ELECTRON LASERS; LITHOGRAPHY; MICROSCOPIC EXAMINATION; SPECTRUM ANALYSIS; ULTRAVIOLET RADIATION; X RAY ANALYSIS; X RAY LASERS; X RAY OPTICS;

VACUUM ULTRAVIOLET (VUV) SPECTRUM;

NUCLEAR INSTRUMENTATION;

EID: 0036566897     PISSN: 01689002     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-9002(02)00342-X     Document Type: Conference Paper

References (11)

1. Improved reflectance and stability of Mo/Si multilayers
2. Initial results from the EUV engineering test stand
3. Multilayer optics for an extreme ultraviolet lithography tool with 70 nm resolution
4. Extreme ultraviolet lithography