Characterization of the PTB EUV reflectometry facility for large EUVL optical components

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 I, Issue , 2003, Pages 265-273

  Tümmler, Johannes ^a   Blume, Heike ^a   Brandt, Guido ^a   Eden, Jens ^a   Meyer, Bernd ^a   Scherr, Hartmut ^a   Scholz, Frank ^a   Scholze, Frank ^a   Ulm, Gerhard ^a  

^a PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

Author keywords

At wavelength characterization; Extreme ultraviolet; Lithography; Metrology; Reflectometry; Synchrotron radiation

Indexed keywords

LITHOGRAPHY; MIRRORS; OPTICS; PROJECTION SYSTEMS; REFLECTION; STORAGE RINGS; SYNCHROTRON RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY; EXTREME ULTRAVIOLET REFLECTOMETERS; VACUUM CHAMBER;

REFLECTOMETERS;

EID: 0141501387     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.482668     Document Type: Conference Paper

References (6)

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2. E. M. Gullikson, S. Mrowka, and B. B. Kaufmann, "Recent developments in EUV reflectometry at the Advanced Light Source," Proc. SPIE 4343, pp. 363 - 373, 2001.
3. R. Klein, A. Gottwald, F. Scholze, R. Thornagel, J. Tümmler, G. Ulm, M. Wedowski, F. Stietz, B. Mertens, N. Koster, and J. V. Elp, "Lifetime testing of EUV optics using intense synchrotron radiation at the PTB radiometry laboratory," Proc. SPIE 4506, pp. 105 - 112, 2001.
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6. F. Scholze, J. Tümmler, and G. Ulm, "High-accuracy radiometry in the EUV range at the PTB soft x-ray beamline," Metrologia 40, pp. S224 - S228, 2003.