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Volumn 165, Issue 1-2, 2009, Pages 9-14

Elaboration of (1 1 1) oriented 3C-SiC/Si layers for template application in nitride epitaxy

Author keywords

Chemical mechanical polishing; Epitaxy of thin films; Gallium nitride; Silicon carbide

Indexed keywords

ALUMINUM GALLIUM NITRIDE; CHEMICAL MECHANICAL POLISHING; EPITAXIAL GROWTH; GALLIUM NITRIDE; HIGH ELECTRON MOBILITY TRANSISTORS; III-V SEMICONDUCTORS;

EID: 72049117118     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2009.02.019     Document Type: Article
Times cited : (30)

References (29)
  • 11
    • 85165830598 scopus 로고    scopus 로고
    • see
    • see www.siltronix.com.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.