Secondary electron emission and charging mechanisms in Auger Electron Spectroscopy and related e-beam techniques

Journal of Electron Spectroscopy and Related Phenomena

Volumn 176, Issue 1-3, 2010, Pages 58-79

  Cazaux, Jacques ^a  

^a Faculty of Sciences   (France)

Author keywords

Auger Electron Spectroscopy; Insulating materials; Secondary electron emission; SEM; Surface analysis

Indexed keywords

CHARGING EFFECT; CHARGING MECHANISM; CRITICAL ENERGY; ELECTRON BEAM TECHNIQUE; MAIN PARAMETERS; NEGATIVE CHARGING; OPERATING CONDITION; POTENTIAL BARRIERS; REGULATION PROCESS; SECONDARY ELECTRON EMISSIONS; SEM; STEADY STATE; TIME DEPENDENCE; X-RAY DETECTOR; YIELD MEASUREMENT;

ANGULAR DISTRIBUTION; AUGERS; BUILDING MATERIALS; ELECTRIC FIELDS; ELECTRON BEAMS; ELECTRONS; INSULATING MATERIALS; MOBILE TELECOMMUNICATION SYSTEMS; SECONDARY EMISSION; SPECIMEN PREPARATION; SPECTRUM ANALYSIS; SPONTANEOUS EMISSION; SURFACE ANALYSIS; SURFACES;

AUGER ELECTRON SPECTROSCOPY;

EID: 71849100830     PISSN: 03682048     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elspec.2009.06.004     Document Type: Article

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