The effect of contamination of dielectric target surfaces under electron irradiation

Applied Surface Science

Volumn 254, Issue 7, 2008, Pages 2110-2113

  Rau, E I ^a  

^a INSTITUTE OF MICROELECTRONICS TECHNOLOGY AND HIGH PURITY MATERIALS   (Russian Federation)

Author keywords

Contamination; Insulators; Second crossover energy point; Secondary electron emission

Indexed keywords

CONTAMINATION; ELECTRON IRRADIATION; SCANNING ELECTRON MICROSCOPY; SECONDARY EMISSION; X RAY ANALYSIS;

ARTIFACTS; ELECTRON EMISSION COEFFICIENT; SECOND CROSSOVER ENERGY; X-RAY MICROANALYZERS;

DIELECTRIC DEVICES;

EID: 37749000575     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.08.076     Document Type: Article

References (16)

1. Muller K.H. Optik 133 (1971) 296
2. Hirsch P., Kassens M., Puttmann M., and Reimer L. Scanning 16 (1994) 101
3. Postek M.T. Scanning 18 (1996) 269
4. Rickerby D.G. Microchim. Acta 13 (1996) 493
5. Amman M., Sleight J., Lombardi D., Welser R., Deshpande M., Reed M., and Guido L. J. Vac. Sci. Technol. B14 (1996) 54
6. Ura S K. In: Thong J.T.L. (Ed). Electron Beam Testing Technology (1993), Plenum, New York p. 200
7. Rau E.I. Scanning 10 (1986) 207
8. Bauer H.E., and Seiler H.J. Scanning Electron Microsc. 3 (1984) 1081
9. Seiler H. J. Appl. Phys. 54 (1983) R1
10. Reimer L. Image Formation In Low-Voltage Scanning Electron Microscopy vol. TT12 (1993), SPIE Press, Bellingham p. 70
11. Kanaya K., Ono S., and Ishigaki F. J. Phys. D: Appl. Phys. 11 (1978) 2425
12. Yong Y.C., Thong J.T.L., and Phang J.C.H. J. Appl. Phys. 84 (1998) 4543
13. Alig R.C., and Bloom S. J. Appl. Phys. 49 (1978) 3476
14. Cazaux J. Nuclear Instrum. Methods Phys. Res. B244 (2006) 307
15. Belhaj M., Jbara O., Filippov M., Rau E., and Andrianov M. Appl. Surf. Sci. 177 (2001) 58
16. Taniguchi J., Miyamoto I., Ohno N., and Honda S. Nuclear Instrum. Methods Phys. Res. B121 (1997) 507