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Volumn 38, Issue 10, 2006, Pages 1348-1356

Dependence of calculated electron effective attenuation lengths on transport mean free paths obtained from two atomic potentials

Author keywords

AES; Electron effective attenuation length; Transport mean free path; XPS

Indexed keywords

ATOMIC POTENTIALS; ELECTRON EFFECTIVE ATTENUATION LENGTH; TRANSPORT MEAN FREE PATH;

EID: 33749562132     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.2460     Document Type: Article
Times cited : (11)

References (36)
  • 5
    • 33749550794 scopus 로고    scopus 로고
    • Seiler DG, Diebold AC, Shaffner TJ, McDonald R, Zollner S, Khosla RP, Secula EM (eds). AIP Conf. Proc. 683 American Institute of Physics: Melville
    • Powell CJ, Jablonski A. In Characterization and Metrology for ULSI Technology 2003, Seiler DG, Diebold AC, Shaffner TJ, McDonald R, Zollner S, Khosla RP, Secula EM (eds). AIP Conf. Proc. 683 American Institute of Physics: Melville, 2003; 321.
    • (2003) Characterization and Metrology for ULSI Technology 2003 , pp. 321
    • Powell, C.J.1    Jablonski, A.2
  • 28
    • 33749575741 scopus 로고    scopus 로고
    • Powell CJ, Jablonski A. (to be published)
    • Powell CJ, Jablonski A. (to be published).
  • 35
    • 33749573582 scopus 로고    scopus 로고
    • Seiler DG, Diebold AC, McDonald R, Ayre CR, Khosla RP, Zollner S, Secula EM (eds). AIP Conf. Proc. 788 American Institute of Physics: Melville
    • Powell CJ, Smekal W, Werner WSM. Characterization and Metrology for ULSI Technology 2005, Seiler DG, Diebold AC, McDonald R, Ayre CR, Khosla RP, Zollner S, Secula EM (eds). AIP Conf. Proc. 788 American Institute of Physics: Melville, 2005; 107.
    • (2005) Characterization and Metrology for ULSI Technology 2005 , pp. 107
    • Powell, C.J.1    Smekal, W.2    Werner, W.S.M.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.