-
1
-
-
0036863636
-
-
Osaka T., Takano N., Kurokawa T., Kaneko T., and Ueno K. J. Electrochem. Soc. 149 (2002) C573
-
(2002)
J. Electrochem. Soc.
, vol.149
-
-
Osaka, T.1
Takano, N.2
Kurokawa, T.3
Kaneko, T.4
Ueno, K.5
-
2
-
-
33846965995
-
-
Yoshino M., Masuda T., Yokoshima T., Sasano J., Shacham-Diamand Y., Matsuda I., Osaka T., Hagiwara Y., and Sato I. J. Electrochem. Soc. 154 (2007) D122
-
(2007)
J. Electrochem. Soc.
, vol.154
-
-
Yoshino, M.1
Masuda, T.2
Yokoshima, T.3
Sasano, J.4
Shacham-Diamand, Y.5
Matsuda, I.6
Osaka, T.7
Hagiwara, Y.8
Sato, I.9
-
3
-
-
0037672208
-
-
Wang Z.L., Sakaue H., Shingubara S., and Takahagi T. Jpn. J. Appl. Phys., Part 1-Regular Papers Short Notes & Rev. Papers 42 (2003) 1843
-
(2003)
Jpn. J. Appl. Phys., Part 1-Regular Papers Short Notes & Rev. Papers
, vol.42
, pp. 1843
-
-
Wang, Z.L.1
Sakaue, H.2
Shingubara, S.3
Takahagi, T.4
-
4
-
-
0034830082
-
-
Kohn A., Eizenberg M., Shacham-Diamand Y., Israel B., and Sverdlov Y. Microelectron. Eng. 55 (2001) 297
-
(2001)
Microelectron. Eng.
, vol.55
, pp. 297
-
-
Kohn, A.1
Eizenberg, M.2
Shacham-Diamand, Y.3
Israel, B.4
Sverdlov, Y.5
-
6
-
-
0842311656
-
-
Chang S.Y., Lin C.W., Hsu H.H., Fang J.H., and Lin S.J. J. Electrochem. Soc. 151 (2004) C81
-
(2004)
J. Electrochem. Soc.
, vol.151
-
-
Chang, S.Y.1
Lin, C.W.2
Hsu, H.H.3
Fang, J.H.4
Lin, S.J.5
-
17
-
-
37549028748
-
-
Chou Y.-H., Sung Y., Ou K.-L., Liu Y.-M., and Ger M.-D. Electrochem. Solid-State Lett. 11 (2008) D30
-
(2008)
Electrochem. Solid-State Lett.
, vol.11
-
-
Chou, Y.-H.1
Sung, Y.2
Ou, K.-L.3
Liu, Y.-M.4
Ger, M.-D.5
-
20
-
-
0036005019
-
-
Xu L.-N., Xu H.-F., Zhou K.-C., Xu A.-Q., Yue Z.-Q., Gu N., Zhang H.-Q., Liu J.-Z., and Chen K.-J. Acta Phys. Chim. Sin. 18 (2002) 284
-
(2002)
Acta Phys. Chim. Sin.
, vol.18
, pp. 284
-
-
Xu, L.-N.1
Xu, H.-F.2
Zhou, K.-C.3
Xu, A.-Q.4
Yue, Z.-Q.5
Gu, N.6
Zhang, H.-Q.7
Liu, J.-Z.8
Chen, K.-J.9
-
21
-
-
0032179158
-
-
Liu J., Zhang L., Gu N., Hong Q., Ren J., and Wu Y. Supramol. Sci. 5 (1998) 705
-
(1998)
Supramol. Sci.
, vol.5
, pp. 705
-
-
Liu, J.1
Zhang, L.2
Gu, N.3
Hong, Q.4
Ren, J.5
Wu, Y.6
-
25
-
-
0032166446
-
-
O'Sullivan E.J., Schrott A.G., Paunovic M., Sambucetti C.J., Marino J.R., Bailey P.J., Kaja S., and Semkow K.W. IBM J. Res. Dev. 42 (1998) 607
-
(1998)
IBM J. Res. Dev.
, vol.42
, pp. 607
-
-
O'Sullivan, E.J.1
Schrott, A.G.2
Paunovic, M.3
Sambucetti, C.J.4
Marino, J.R.5
Bailey, P.J.6
Kaja, S.7
Semkow, K.W.8
-
26
-
-
33645122412
-
-
Charbonnier M., Romand M., Goepfert Y., Léonard D., and Bouadi M. Surf. Coat. Technol. 200 (2006) 5478
-
(2006)
Surf. Coat. Technol.
, vol.200
, pp. 5478
-
-
Charbonnier, M.1
Romand, M.2
Goepfert, Y.3
Léonard, D.4
Bouadi, M.5
-
27
-
-
0032689277
-
-
Kim S.H., Chung D.S., Park K.C., Kim K.B., and Min S.H. J. Electrochem. Soc. 146 (1999) 1455
-
(1999)
J. Electrochem. Soc.
, vol.146
, pp. 1455
-
-
Kim, S.H.1
Chung, D.S.2
Park, K.C.3
Kim, K.B.4
Min, S.H.5
-
28
-
-
0033640194
-
-
Ramberg C.E., Blanquet E., Pons M., Bernard C., and Madar R. Microelectron. Eng. 50 (2000) 357
-
(2000)
Microelectron. Eng.
, vol.50
, pp. 357
-
-
Ramberg, C.E.1
Blanquet, E.2
Pons, M.3
Bernard, C.4
Madar, R.5
-
29
-
-
0033902132
-
-
Olowolafe J.O., Rau I., Unruh K.M., Swann C.P., Jawad Z.S., and Alford T. Thin Solid Films 365 (2000) 19
-
(2000)
Thin Solid Films
, vol.365
, pp. 19
-
-
Olowolafe, J.O.1
Rau, I.2
Unruh, K.M.3
Swann, C.P.4
Jawad, Z.S.5
Alford, T.6
-
31
-
-
23744435774
-
-
Zhong S., Yang Z.-H., Cai J., He H.-.J., Wen J.-S., and Liu C. J. Electrochem. Soc. 152 (2005) C466
-
(2005)
J. Electrochem. Soc.
, vol.152
-
-
Zhong, S.1
Yang, Z.-H.2
Cai, J.3
He, H.-.J.4
Wen, J.-S.5
Liu, C.6
-
34
-
-
0004196539
-
-
American Chemical Society, Washington, D.C. p. 210
-
Calvert J.M., Dressick W.J., Dulcey C.S., Chen M.S., Georger J.H., Stenger D.A., Koloski T.S., and Calabrese G.S. Polymers for Microelectronics, Resists and Dielectrics (1994), American Chemical Society, Washington, D.C. p. 210
-
(1994)
Polymers for Microelectronics, Resists and Dielectrics
-
-
Calvert, J.M.1
Dressick, W.J.2
Dulcey, C.S.3
Chen, M.S.4
Georger, J.H.5
Stenger, D.A.6
Koloski, T.S.7
Calabrese, G.S.8
-
41
-
-
21644446500
-
-
Ou K.-L., Wu C.-C., Hsu C.-C., Chen C.-S., Shyng Y.-C., and Wu W.-F. Microelectron. Eng. 81 (2005) 44
-
(2005)
Microelectron. Eng.
, vol.81
, pp. 44
-
-
Ou, K.-L.1
Wu, C.-C.2
Hsu, C.-C.3
Chen, C.-S.4
Shyng, Y.-C.5
Wu, W.-F.6
|