Ultrathin Ni-Mo-P diffusion barriers deposited using nonisothermal deposition method in acid bath

Electrochemical and Solid-State Letters

Volumn 11, Issue 2, 2008, Pages

  Chou, Yu Hsien ^a   Sung, Yuh ^a   Ou, Keng Liang ^b   Liu, Yih Ming ^c   Ger, Ming Der ^c,d  

^a NATIONAL DEFENSE UNIVERSITY   (Taiwan)

^b CHUNG SHAN INSTITUTE OF SCIENCE AND TECHNOLOGY   (Taiwan)

^c TAIPEI MEDICAL UNIVERSITY   (Taiwan)

^d ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DEPOSITION; NICKEL COMPOUNDS; THERMODYNAMIC STABILITY;

ACID BATHS; NICKEL-MOLYBDENUM- PHOSPHORUS (NI-MO-P); NONISOTHERMAL DEPOSITION;

ULTRATHIN FILMS;

EID: 37549028748     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2821024     Document Type: Article

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